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</o:shapelayout></xml><![endif]--></head><body lang=EN-US link="#0563C1" vlink="#954F72"><div class=WordSection1><p class=MsoNormal>Hi Esta,<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>I have tried both. Both evaporation and sputtering could do. There should not be contamination issue. There definitely will be evaporated SiOx sticking to the sidewall of the evaporator chamber. However they are chemically stable thus won’t react with subsequent metal deposition. The evaporated SiO2 and sputtered SiO2 are generally porous to some extent. And the evaporated one seems to be even more porous. <o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Best,<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Zhongrui<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Postdoc ECE UMass<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><div><div style='border:none;border-top:solid #E1E1E1 1.0pt;padding:3.0pt 0in 0in 0in'><p class=MsoNormal><b>From:</b> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu] <b>On Behalf Of </b>Price, Aimee<br><b>Sent:</b> Tuesday, August 1, 2017 9:47 AM<br><b>To:</b> Abelev, Esta <eabelev@pitt.edu>; labnetwork@mtl.mit.edu<br><b>Subject:</b> Re: [labnetwork] Metamaterials deposition - Ag and SiO2<o:p></o:p></p></div></div><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><span style='color:#1F497D'>Esta,<o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'>We have not, to my knowledge, done multilayer stacks. However, we do evaporate SiO2 in our “multi-use” ebeam evaporator but not in the one we use for metal contacts. We use a different quartz crystal monitor for SiO2 and Hafnium oxide than we do for metals. We have found that using separate crystals works best to maintain proper z-ratios for both.<o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='color:#1F497D'>I’ve copied our lab manager who has worked extensively on this. <o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'><o:p> </o:p></span></p><p class=MsoNormal><span style='color:#1F497D'>Aimee<o:p></o:p></span></p><p class=MsoNormal><span style='color:#1F497D'><o:p> </o:p></span></p><div><div style='border:none;border-top:solid #B5C4DF 1.0pt;padding:3.0pt 0in 0in 0in'><p class=MsoNormal><b><span style='font-size:10.0pt;font-family:"Tahoma",sans-serif'>From:</span></b><span style='font-size:10.0pt;font-family:"Tahoma",sans-serif'> <a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a> [<a href="mailto:labnetwork-bounces@mtl.mit.edu">mailto:labnetwork-bounces@mtl.mit.edu</a>] <b>On Behalf Of </b>Abelev, Esta<br><b>Sent:</b> Monday, July 31, 2017 8:10 PM<br><b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br><b>Subject:</b> [labnetwork] Metamaterials deposition - Ag and SiO2<o:p></o:p></span></p></div></div><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Dear Colleagues,<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Recently, we got a request to deposit SiO2 and Ag in our e-beam evaporator. We have only one e-beam UHV evaporator (brand new) which we planned to dedicate for metals (only). From what was discussed the group is planning to deposit alternative layers of SiO2 and Ag (10-20nm thick) to ~1micron thick overall thickness. <o:p></o:p></p><p class=MsoNormal>Did anyone have experience with similar multilayer structures, would you advise me if e-beam evaporation or sputtering would better for this project?<o:p></o:p></p><p class=MsoNormal>If we will have to go with evaporation of SiO2, will it have contamination issues with metal deposition?<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal>Thanks for advice, Esta<o:p></o:p></p><p class=MsoNormal><o:p> </o:p></p><p class=MsoNormal><span style='font-size:9.0pt;font-family:Atlanta'>-----------------------</span><o:p></o:p></p><p class=MsoNormal><b><span style='font-size:9.0pt;font-family:Atlanta'>Esta Abelev, PhD</span></b><o:p></o:p></p><p class=MsoNormal><span style='font-size:9.0pt;font-family:Atlanta'>Technical Director,<i> </i>Petersen Institute of NanoScience and Engineering </span><o:p></o:p></p><p class=MsoNormal><span style='font-size:9.0pt;font-family:Atlanta'>University of Pittsburgh | 3700 O’Hara Street | 636| Pittsburgh, PA 15261</span><o:p></o:p></p><p class=MsoNormal><span style='font-size:9.0pt;font-family:Atlanta'>412-383-4096 | <a href="mailto:eabelev@pitt.edu"><span style='color:#0066CC;text-decoration:none'>eabelev@pitt.edu</span></a> | <a href="https://na01.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.nano.pitt.edu%2F&data=01%7C01%7Ceabelev%40pitt.edu%7C9f5bd58ba84940765cf308d4024fbe18%7C9ef9f489e0a04eeb87cc3a526112fd0d%7C1&sdata=3KfbG5VbshqdoIAPxvX%2F2s1UeU7ultmBoZmm%2FaZ2Itc%3D&reserved=0"><span style='color:purple;text-decoration:none'>nano.pitt.edu</span></a></span><o:p></o:p></p><p class=MsoNormal><span style='color:black'><o:p> </o:p></span></p><p class=MsoNormal><o:p> </o:p></p></div></body></html>