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<div class="moz-cite-prefix">Long ago in 1995 I wrote a paper that
includes the KOH etching process. See
<a class="moz-txt-link-freetext" href="http://avs.scitation.org/doi/10.1116/1.588258">http://avs.scitation.org/doi/10.1116/1.588258</a> also known as JVST
B v13(6) 2745 (1995).<br>
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If your customer is concerned about potassium ions then you can
use a strong solution of TMAH instead. You can purchase 25% TMAH
pre-mixed. It's a lot more expensive than KOH.<br>
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<font size="-2">--------------------------------<br>
Michael Rooks <br>
Yale Institute of Nanoscience and Quantum Engineering <br>
<a href="http://nano.yale.edu">nano.yale.edu</a>
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On 08/11/2017 09:03 AM, Mathilde Isabelle Barriet wrote:<br>
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<blockquote
cite="mid:4e953489fda344f3adbcb0e6dadbc813@it-ex11.win.ntnu.no"
type="cite">
<pre wrap="">Dear All,
I have a user who wants to do KOH etch of silicon but since we do not have an established process in the lab, I am wondering if I could get some practical guidance on the best set ups.
Also, this user is especially concerned about contaminating his Si wafers with metals so I wonder what degree of purity of KOH is commonly used and if buying the best quality available make a difference on the Si contamination or not.
If anyone has experience with this, please let me know.
Thanks
Mathilde
Senior Engineer
NTNU NanoLab
----------------------------
Sem Sælands vei 14, K1-113
NO-7491 Trondheim
+47 91 89 72 08
<a class="moz-txt-link-abbreviated" href="http://www.ntnu.no/nanolab">www.ntnu.no/nanolab</a>
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