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<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Here at NTNU we use electra from Allresist
<a href="http://www.allresist.com/ar-pc-5090-5091-electra-92/">http://www.allresist.com/ar-pc-5090-5091-electra-92/</a> It’s a cheaper alternative. Instead of three variants there are two, with one for novolac resists. This works well and we are able to
patter large areas with patterns smaller than 100nm. If you are unaware the CSAR 62 they mention is an affordable alternative to ZEP.
<a href="http://www.allresist.com/wp-content/uploads/sites/2/2016/12/allresist_produktinfos_ar-p6200_englisch.pdf">
http://www.allresist.com/wp-content/uploads/sites/2/2016/12/allresist_produktinfos_ar-p6200_englisch.pdf</a>. <o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Kind regards<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Mark
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:windowtext">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:windowtext"> labnetwork-bounces@mtl.mit.edu
[mailto:labnetwork-bounces@mtl.mit.edu] <b>On Behalf Of </b>Michael Rooks<br>
<b>Sent:</b> Monday, August 21, 2017 11:26 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] EBeam Lithography on Glass substrates<o:p></o:p></span></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt">We commonly use a 10 nm gold film, sputtered on top of ZEP or PMMA. The film can be removed with KI/I solution (Transene TFA etchant) before development.
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The University of Minnesota has a nice web page about conducting layers for ebeam:
<a href="http://apps.mnc.umn.edu/archive/ebpgwiki/Charging.html">http://apps.mnc.umn.edu/archive/ebpgwiki/Charging.html</a><o:p></o:p></p>
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<span style="font-size:7.5pt">--------------------------------<br>
Michael Rooks <br>
Yale Institute of Nanoscience and Quantum Engineering <br>
<a href="http://nano.yale.edu">nano.yale.edu</a> </span><br>
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<p class="MsoNormal">On 08/21/2017 12:26 PM, Jugessur, Aju S wrote:<o:p></o:p></p>
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<p class="MsoNormal">Hi, <o:p></o:p></p>
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<p class="MsoNormal">I have a user who is having inconsistent results when exposing patterns (100-200 nm in size) on glass substrate.<o:p></o:p></p>
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<p class="MsoNormal">He is using a 5 nm Al layer between the 100nm ZEP and glass substrate. He obtained good results but it does not seem reproducible all the times.<o:p></o:p></p>
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<p class="MsoNormal">He is also ensuring that there is good contact between the sample clips and the metal layer. Another approach would be to place the metal on top of the resist.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">He has also used the conducting polymer PDOT on ZEP but it does not seem to adhere too well. He could also be doing a step or steps consistently wrong and be unaware.<o:p></o:p></p>
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<p class="MsoNormal">This is quite a common and established process but I would like to see if the members have any suggestions to ensure reproducible and consistent results for ebeam lithography on glass substrates.<o:p></o:p></p>
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<p class="MsoNormal">I will provide more information/details once I receive some feedback.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Thanks,<o:p></o:p></p>
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<p class="MsoNormal">Regards<o:p></o:p></p>
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<p class="MsoNormal">Aju<o:p></o:p></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt"><i><span style="color:#0096FF">Aju Jugessur, Ph.D.<br>
Director, University of Iowa Microfabrication Facility (UIMF)<br>
Optical Science and Technology Center<br>
Professor Adjunct, Physics and Astronomy<br>
University of Iowa<br>
Office: IATL 202, Tel: 319-3532342<br>
Labs: IATL 170, 172, 174<br>
<a href="https://ostc.uiowa.edu/uimf">https://ostc.uiowa.edu/uimf</a></span></i><br>
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<o:p></o:p></p>
<pre>_______________________________________________<o:p></o:p></pre>
<pre>labnetwork mailing list<o:p></o:p></pre>
<pre><a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><o:p></o:p></pre>
<pre><a href="https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork">https://www-mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a><o:p></o:p></pre>
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