<div dir="ltr">Frank,<div><br></div><div>There have been a lot of literature and studies on microloading effect and aspect ratio dependent etching (ARDE) in RIE and DRIE technology. See the following two papers which discuss the mask design to study microloading and ARDE effects.</div><div><br></div><div>Critical aspect ratio dependence in deep reactive ion etching of silicon<br></div><div><a href="http://ieeexplore.ieee.org/abstract/document/1217094/">http://ieeexplore.ieee.org/abstract/document/1217094/</a><br></div><div><br></div><div>Maximum achievable aspect ratio in deep reactive ion etching of silicon due to aspect ratio dependent transport and the microloading effect<br></div><div><a href="http://avs.scitation.org/doi/abs/10.1116/1.2101678">http://avs.scitation.org/doi/abs/10.1116/1.2101678</a><br></div><div><br></div><div>Hope this helps.</div><div><br></div><div>Junghoon Yeom</div><div><br></div></div><div class="gmail_extra"><br><div class="gmail_quote">On Sun, Aug 27, 2017 at 7:27 PM, Fouad Karouta <span dir="ltr"><<a href="mailto:fouad.karouta@anu.edu.au" target="_blank">fouad.karouta@anu.edu.au</a>></span> wrote:<br><blockquote class="gmail_quote" style="margin:0 0 0 .8ex;border-left:1px #ccc solid;padding-left:1ex">
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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1f497d">Hi Frank,<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1f497d"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1f497d">I am not sure what you mean by loading effect. To me, loading effect means: etch rate depends on sample size, sample size small etch
rate higher as compared to same patterns with larger sample. Maybe it is better to explain more in details what you’re after.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1f497d">Maybe you are mixing up with what is called leg effect which means higher etch rate with larger pattern as compared to smaller patterns.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1f497d"><u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1f497d">Regards, Fouad<u></u><u></u></span></p>
<p class="MsoNormal"><a name="m_8322793722488510997__MailEndCompose"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1f497d"><u></u> <u></u></span></a></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> <a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a> [mailto:<a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@<wbr>mtl.mit.edu</a>]
<b>On Behalf Of </b>Chen Yulong (Frank)<br>
<b>Sent:</b> Friday, 25 August 2017 11:07 PM<br>
<b>To:</b> labnetwork <<a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a>><br>
<b>Subject:</b> [labnetwork] Dry etch test pattern for investigation of micro loading effect<u></u><u></u></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Microsoft YaHei UI",sans-serif;color:black">Hi<u></u><u></u></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Microsoft YaHei UI",sans-serif;color:black">I am current using an ICP RIE etch tool to fabricate silicon mold for microfluidic. Since the dry etch process have the micro loading effect, I would
like to use some test pattern to find the <span style="background:white">appropriate process.</span><u></u><u></u></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Microsoft YaHei UI",sans-serif;color:black;background:white">Does anyone that has some recommend test pattern to investigate the micro loading effect?</span><span style="font-size:10.5pt;font-family:"Microsoft YaHei UI",sans-serif;color:black"><u></u><u></u></span></p>
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<p class="MsoNormal"><span style="font-size:10.5pt;font-family:"Microsoft YaHei UI",sans-serif;color:black">Regards,<u></u><u></u></span></p>
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<h4 style="margin:0cm;margin-bottom:.0001pt;line-height:21.0pt;zoom:1"><span style="font-family:"Verdana",sans-serif;color:black"><img id="m_8322793722488510997_x0000_i1026" src="https://exmail.qq.com/cgi-bin/viewfile?type=logo&domain=sustc.edu.cn"><u></u><u></u></span></h4>
<h4 style="margin:0cm;margin-bottom:.0001pt;line-height:21.0pt;zoom:1"><span lang="ZH-CN" style="font-family:"Microsoft YaHei UI",sans-serif;color:black">陈宇龙</span><span style="font-family:"Verdana",sans-serif;color:black">(CHEN Yulong) </span><span style="font-size:10.5pt;font-family:"Verdana",sans-serif;color:black">PhD Student</span><span style="font-family:"Verdana",sans-serif;color:black"><u></u><u></u></span></h4>
<p class="m_8322793722488510997department" style="line-height:16.5pt"><span style="font-size:10.5pt;font-family:"Verdana",sans-serif;color:#a0a0a0">Department of Materials <wbr>Science and Engineering<br>
SUSTech <a href="http://www.sustc.edu.cn/en/" target="_blank">http://www.sustc.edu.cn/en/</a><br>
Tel: <a href="tel:+86%20185%208905%200065" value="+8618589050065" target="_blank">+86-18589050065</a><br>
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