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<div class="moz-cite-prefix">Hello,<br>
The Iron Fe is one of the worst contaminants material for Silicon
processing.<br>
It drastically affects the Breakdown voltage of the PN junctions,
and the same<br>
for the dielectric breakdown values of the Silicon related
dielectrics.<br>
I do not know its effect on High K exotic dielectrics, etc.<br>
Thanks, Bernard<br>
<br>
<br>
On 10/16/17 4:10 PM, Chito Kendrick wrote:<br>
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Dear Labnetwork colleagues,<br>
<br>
I have a user that wants to study iron oxide using our home/custom
build ALD. Currently it is still going under optimization for HfO2
as I just got it running a month ago. Our system would have the
capabilities to run some of the lesser hazardous precursors, but I
was wanting to know if anyone has experience with doing ALD of
FeOx and if there are any major issues to look out for, e.g.
contamination, build up of toxic by products. The user only wants
to study samples with 1-2 ML depositions with water as the
oxidizer.<br>
<p>Regards.</p>
<p>Chito Kendrick <br>
</p>
<br>
<div class="moz-signature">-- <br>
<a moz-do-not-send="true"
href="https://sites.google.com/site/chitokendrickphd/">Chito
Kendrick Ph.D.</a><br>
<br>
Managing Director of the Microfabrication Facility<br>
Research Assistant Professor<br>
Electrical and Computer Engineering<br>
Michigan Technological University<br>
Room 436 M&M Building<br>
1400 Townsend Dr.<br>
Houghton, Michigan 49931-1295<br>
<br>
814-308-4255<br>
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