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<!--[if !mso]><style>v\:* {behavior:url(#default#VML);}
o\:* {behavior:url(#default#VML);}
w\:* {behavior:url(#default#VML);}
.shape {behavior:url(#default#VML);}
</style><![endif]--><style><!--
/* Font Definitions */
@font-face
{font-family:"Cambria Math";
panose-1:2 4 5 3 5 4 6 3 2 4;}
@font-face
{font-family:Calibri;
panose-1:2 15 5 2 2 2 4 3 2 4;}
@font-face
{font-family:Tahoma;
panose-1:2 11 6 4 3 5 4 4 2 4;}
/* Style Definitions */
p.MsoNormal, li.MsoNormal, div.MsoNormal
{margin:0cm;
margin-bottom:.0001pt;
font-size:11.0pt;
font-family:"Calibri",sans-serif;}
a:link, span.MsoHyperlink
{mso-style-priority:99;
color:#0563C1;
text-decoration:underline;}
a:visited, span.MsoHyperlinkFollowed
{mso-style-priority:99;
color:#954F72;
text-decoration:underline;}
p
{mso-style-priority:99;
mso-margin-top-alt:auto;
margin-right:0cm;
mso-margin-bottom-alt:auto;
margin-left:0cm;
font-size:12.0pt;
font-family:"Times New Roman",serif;}
p.MsoAcetate, li.MsoAcetate, div.MsoAcetate
{mso-style-priority:99;
mso-style-link:"Balloon Text Char";
margin:0cm;
margin-bottom:.0001pt;
font-size:8.0pt;
font-family:"Tahoma",sans-serif;}
span.BalloonTextChar
{mso-style-name:"Balloon Text Char";
mso-style-priority:99;
mso-style-link:"Balloon Text";
font-family:"Tahoma",sans-serif;}
p.msonormal0, li.msonormal0, div.msonormal0
{mso-style-name:msonormal;
mso-style-priority:99;
mso-margin-top-alt:auto;
margin-right:0cm;
mso-margin-bottom-alt:auto;
margin-left:0cm;
font-size:12.0pt;
font-family:"Times New Roman",serif;}
span.EmailStyle21
{mso-style-type:personal;
font-family:"Calibri",sans-serif;
color:windowtext;}
span.EmailStyle22
{mso-style-type:personal;
font-family:"Calibri",sans-serif;
color:#1F497D;}
span.EmailStyle23
{mso-style-type:personal;
font-family:"Calibri",sans-serif;
color:#17365D;}
span.EmailStyle24
{mso-style-type:personal-reply;
font-family:"Calibri",sans-serif;
color:#1F497D;}
.MsoChpDefault
{mso-style-type:export-only;
font-size:10.0pt;}
@page WordSection1
{size:612.0pt 792.0pt;
margin:72.0pt 72.0pt 72.0pt 72.0pt;}
div.WordSection1
{page:WordSection1;}
--></style><!--[if gte mso 9]><xml>
<o:shapedefaults v:ext="edit" spidmax="1026" />
</xml><![endif]--><!--[if gte mso 9]><xml>
<o:shapelayout v:ext="edit">
<o:idmap v:ext="edit" data="1" />
</o:shapelayout></xml><![endif]-->
</head>
<body lang="EN-AU" link="#0563C1" vlink="#954F72">
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<p class="MsoNormal"><span style="color:#1F497D;mso-fareast-language:EN-US">Hi Sherine,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D;mso-fareast-language:EN-US">Further to Craig remarks I wonder if the CF4/Ar is the right gas mixture to etch ZnO where the etch seems more physical upon your description then chemical. Note Zn fluoride is quite
non-volatile. If you look in literature a more chemical etching of ZnO would use CH4-H2. However the latter needs to be alternated with short oxygen plasma to remove polymers formed during the CH4:H2 step.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D;mso-fareast-language:EN-US">Regards,
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D;mso-fareast-language:EN-US">Fouad Karouta<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">*************************************<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D">Manager ANFF ACT Node<o:p></o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US">From:</span></b><span lang="EN-US"> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>WARD Craig<br>
<b>Sent:</b> Saturday, 18 November 2017 5:30 AM<br>
<b>To:</b> Sherine George <Sherine.George@rice.edu><br>
<b>Cc:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] ZnO etch via ICP-RIE, impact to vacuum chamber?<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#17365D">Sherine,<o:p></o:p></span></p>
<div>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#17365D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#17365D">As with sputtering any metal in a vacuum chamber there will be some metal redeposited in the chamber. How much depends on the process itself, mask open area, etch rate and throughput.
This will most likely not cause any harm the ICP tool unless you get sufficient buildup of a metallic coating on the ICP tube itself then this will manifest in plasma stability and striking issues. If this does happen then you can always bead blast the tube
to remove any residual metal. So, as far as the tool goes you are fairly safe. I cannot offer the same reassurance for device performance. As soon as you have introduced metal into an etch chamber there is a risk of contamination through re-sputtering of
the metal deposited onto wafer clamps etc..<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#17365D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#17365D">If you have any further process related questions with Oxford tools please don’t hesitate to let me know.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#17365D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#002060">Best Regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#002060"> <o:p></o:p></span></p>
<p class="MsoNormal"><b><span lang="EN-US" style="font-size:10.0pt;color:#002060">Craig Ward</span></b><span lang="EN-US" style="font-size:10.0pt;color:#002060"> <o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:10.0pt;color:#1F497D">US Applications Manager</span><span lang="EN-US" style="font-size:10.0pt;color:#002060"><br>
<br>
<b>Oxford Instruments America, Inc.</b> <br>
300 Baker Avenue, Suite 150,<o:p></o:p></span></p>
<p class="MsoNormal" style="margin-bottom:12.0pt"><span lang="EN-US" style="font-size:10.0pt;color:#002060">Concord, MA 01742, USA
<br>
Mobile: +1 (978) 764 7023 <br>
Email: <a href="mailto:craig.ward@oxinst.com">craig.ward@oxinst.com</a> <br>
<a href="http://www.oxford-instruments.com/" target="_blank"><span style="color:#002060">http://www.oxford-instruments.com/</span></a></span><span lang="EN-US" style="font-size:10.0pt;color:#17365D">
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:10.0pt;font-family:"Tahoma",sans-serif">From:</span></b><span lang="EN-US" style="font-size:10.0pt;font-family:"Tahoma",sans-serif">
<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a> [<a href="mailto:labnetwork-bounces@mtl.mit.edu">mailto:labnetwork-bounces@mtl.mit.edu</a>]
<b>On Behalf Of </b>Sherine George<br>
<b>Sent:</b> Wednesday, November 15, 2017 4:32 PM<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> -|EXT|- [labnetwork] ZnO etch via ICP-RIE, impact to vacuum chamber?<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Hello All,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"> <o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">We have a user requesting to use our singleton Oxford PlasmaPro ICP-RIE system to etch ZnO via a CF<sub>4</sub>/Ar mix. This request is based on a paper characterizing this etch chemistry (attached). The etch mechanism
presented in the paper is the creation of Zn(CF<sub>X</sub>)<sub>y</sub> compounds via CF<sub>3
</sub>radicals and CF<sub>3</sub><sup>+</sup><sub> </sub>present in the plasma that are subsequently removed via Ar+ ion bombardment.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"> <o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Our primary concern is with the possibility of creation of elemental Zn as a byproduct that lingers in the chamber with subsequent long term consequences to the chamber vacuum quality. Is this concern valid? Does anyone
have experience with such an etch involving ZnO and is able to provide guidance on best practices?
<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"> <o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Thanks,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"> <o:p></o:p></span></p>
<p class="MsoNormalCxSpMiddle" style="margin-bottom:12.0pt;mso-add-space:auto"><span lang="EN-US" style="color:black">Sherine George, Ph.D.<br>
Research Scientist, Nanofabrication Cleanroom<br>
Shared Equipment Authority, Rice University</span><span lang="EN-US"><o:p></o:p></span></p>
<p class="MsoNormalCxSpMiddle" style="margin-bottom:12.0pt;mso-add-space:auto"><span lang="EN-US" style="color:black">Abercrombie, C112<br>
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<p class="MsoNormal"><span lang="EN-US"> <o:p></o:p></span></p>
<p class="MsoNormal" style="margin-bottom:12.0pt"><span lang="EN-US" style="font-size:12.0pt;font-family:"Times New Roman",serif;background:white"><o:p> </o:p></span></p>
<p align="center" style="text-align:center"><span lang="EN-US" style="background:white">Click
<a href="https://www.mailcontrol.com/sr/MZbqvYs5QwJvpeaetUwhCQ==">here</a> to report this email as spam.<o:p></o:p></span></p>
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