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<div><span></span>Dear All,</div><div><br></div><div>I would like to use LPCVD to deposit low stress silicon nitride on Al2O3 (deposit by ALD). It is safe for <b>Al2O3</b> to <b>against </b>the by product "<b>HCl</b>" from the <span style="font-size: 10.5pt; line-height: 1.5; background-color: window;">Precursor DCS and NH3.</span></div><div><span style="font-size: 10.5pt; line-height: 1.5; background-color: window;"><br></span></div><div><span style="font-size: 10.5pt; line-height: 1.5; background-color: window;">Thanks.</span></div><div><span style="font-size: 10.5pt; line-height: 1.5; background-color: window;"><br></span></div><div><span style="font-size: 10.5pt; line-height: 1.5; background-color: window;">I have found a document on the snf website of standford, it seems that ALD Al2O3 is safe in the LPCVD silicon nitride process.</span></div>
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<div><span><h4 class="name" style="font-family: Verdana; margin: 0px; line-height: 28px; zoom: 1;"><img src="https://exmail.qq.com/cgi-bin/viewfile?type=logo&domain=sustc.edu.cn"></h4><h4 class="name" style="font-family: Verdana; margin: 0px; line-height: 28px; zoom: 1;">³ÂÓîÁú(CHEN Yulong) <span style="background-color: rgba(0, 0, 0, 0); font-size: 10.5pt; line-height: 1.5;">PhD Student</span></h4><p class="position" style="font-family: Verdana; margin-right: 0px; margin-left: 0px; line-height: 22px; color: rgb(160, 160, 160);"></p><p class="department" style="font-family: Verdana; margin-right: 0px; margin-left: 0px; line-height: 22px; color: rgb(160, 160, 160);"><span style="color: rgb(160, 160, 160); background-color: rgba(0, 0, 0, 0);">Department of Materials Science and Engineering<br>SUSTech </span><span style="color: rgb(160, 160, 160); background-color: rgba(0, 0, 0, 0);"></span><span style="color: rgb(160, 160, 160); background-color: rgba(0, 0, 0, 0);"></span> <a href="http://www.sustc.edu.cn/en/">http://www.sustc.edu.cn/en/</a><span style="color: rgb(160, 160, 160); background-color: rgba(0, 0, 0, 0);"><br>Tel: +86-18589050065<br> </span></p>
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