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Hello,<br>
The system will get contaminated with Alkali metal Lithium which
is a highly mobile ion in Si, SiO2<br>
and actually it is worst than Sodium for Si based devices.<br>
Thanks, Bernard<br>
<br>
On 1/18/18 2:28 PM, Horng, Paul S. wrote:<br>
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<p class="MsoNormal">Hi,<o:p></o:p></p>
<p class="MsoNormal">Has anyone had experience with plasma
etching of LiNbO3 films ? It is hard to etch so higher platen
power is needed to enhance physical sputtering. What is the
impact on etch rate of other processes like etching of Si,
SiO2, SiN, etc. in the same chamber ? How often is chamber
liner needed to be scrubbed clean ? Will it shorten the life
of turbo pump ? <o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Thank You,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Paul S. Horng, Ph.D<o:p></o:p></p>
<p class="MsoNormal">Process Engineer, UD NanoFab<o:p></o:p></p>
<p class="MsoNormal">457 ISE Lab<o:p></o:p></p>
<p class="MsoNormal">221 Academy Street, Newark, DE 19716<o:p></o:p></p>
<p class="MsoNormal">(302)831-4827<o:p></o:p></p>
<p class="MsoNormal"><a class="moz-txt-link-freetext" href="http://udnf.udel.edu">http://udnf.udel.edu</a><o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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