<div dir="ltr"><div>Hello Vincent,<br><br></div>
<p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif">We have two Oxford ICP RIE tools (No cryo cooling). <br></p><p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif">On both the tools we face issues with the Helium leak. Most of our users have smaller sample sizes (manually cut), so we use cool grease to stick them on the carrier wafer. The helium flow range acceptable is < 8sccm in these tools and we do not accept anything beyond 10sccm. We address the issue by an open chamber clean as most of the times we end up having cool grease on the chuck. <span> </span>Also if carrier wafer edges are rough or pin holes present, leak is high and we would change the carrier wafer.<span></span></p>
<p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif">As you mentioned, is it possible to share the dwg file we could also give a try with quartz wafers.</p><p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif"><span style="font-size:11pt">It would be great to know if these issues are more common to Oxford tool or is it general?</span><br></p><p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif"><span style="font-size:11pt">Regards</span><br></p><p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif">
<font face="Calibri,Helvetica,sans-serif" size="3" color="black"><font face="Calibri,Helvetica,sans-serif,EmojiFont,Apple Color Emoji,Segoe UI Emoji,NotoColorEmoji,Segoe UI Symbol,Android Emoji,EmojiSymbols" size="3" color="black"></font></font></p><div><font face="Calibri,Helvetica,sans-serif" size="3" color="black"><font face="Calibri,Helvetica,sans-serif,EmojiFont,Apple Color Emoji,Segoe UI Emoji,NotoColorEmoji,Segoe UI Symbol,Android Emoji,EmojiSymbols" size="3" color="black"><font face="arial,sans-serif" size="2" color="#222222"><font face="times new roman,serif" color="#0B5394"><span style="color:rgb(0,111,201);font-size:12pt">Smitha Nair</span><span style="color:rgb(0,111,201);font-size:12pt"></span><br> </font></font></font></font></div><font face="Calibri,Helvetica,sans-serif" size="3" color="black"><font face="Calibri,Helvetica,sans-serif,EmojiFont,Apple Color Emoji,Segoe UI Emoji,NotoColorEmoji,Segoe UI Symbol,Android Emoji,EmojiSymbols" size="3" color="black"> <span style="color:rgb(0,111,201);font-size:12pt"></span> <div><font face="arial,sans-serif" size="2" color="#222222"><font face="times new roman,serif" color="#0B5394"><span style="color:rgb(0,111,201);font-size:12pt">Technology Manager <br> </span></font></font></div> <span style="color:rgb(0,111,201);font-size:12pt"></span> <div><font face="arial,sans-serif" size="2" color="#222222"><font face="times new roman,serif" color="#0B5394"><span style="color:rgb(0,111,201);font-size:12pt">National Nanofabrication Centre (NNFC),</span></font></font></div> <span style="color:rgb(0,111,201);font-size:12pt"></span> <div><font face="arial,sans-serif" size="2" color="#222222"><font face="times new roman,serif" color="#0B5394"><span style="color:rgb(0,111,201);font-size:12pt">Centre for Nano Science and Engineering (CeNSE),</span></font></font></div> <span style="color:rgb(0,111,201);font-size:12pt"></span> <div><font face="arial,sans-serif" size="2" color="#222222"><font face="times new roman,serif" color="#0B5394"><span style="color:rgb(0,111,201);font-size:12pt">Indian Institute of Science (IISc),</span></font></font></div> <span style="color:rgb(0,111,201);font-size:12pt"></span> <div><font face="arial,sans-serif" size="2" color="#222222"><font face="times new roman,serif" color="#0B5394"><span style="color:rgb(0,111,201)"><span style="font-size:12pt">Bangalore-560012</span>.<br></span></font></font></div><div><font face="arial,sans-serif" size="2" color="#222222"><font face="times new roman,serif" color="#0B5394"><span style="color:rgb(0,111,201)"><br></span></font></font></div></font></font> <br><p></p><p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif"><br></p><p class="MsoNormal" style="margin:0cm 0cm 10pt;line-height:115%;font-size:11pt;font-family:"Calibri",sans-serif"><br><span></span></p>
<br><div class="gmail_extra"><br><div class="gmail_quote">On Sat, Feb 17, 2018 at 2:18 AM, Luciani, Vincent (Fed) <span dir="ltr"><<a href="mailto:Vincent.Luciani@nist.gov" target="_blank">Vincent.Luciani@nist.gov</a>></span> wrote:<br><blockquote class="gmail_quote" style="margin:0 0 0 .8ex;border-left:1px #ccc solid;padding-left:1ex">
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<p class="MsoNormal">Hello All,<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">We have 2 Oxford Plasmalab 100 ICP etch tools that are heavily used. 100 mm wafers are the most popular. I am sure I discussed with many of you the trials and tribulations about these tools. My question is about a yur experiences and
lessons learned with regard to keeping the helium leak rate from underneath the wafer under control. I am trying to get a general idea of what is typical and how we are doing compared to that. We have several users that utilize the cryonic etching capability
of our tools so the helium cooling is very important. For those using the tool at -100 C, we find that 8 sccm is too high and users request repair. We generally try to keep the leak rate < 5 sccm at all time but find this difficult to do with the variety
of substrates and etch recipes. We made some progress by ordering specially made quartz discs with a cutout for the wafer flat for better wafer positioning. I am happy to share the dwg if anyone would like it.<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">What is your experience? What leak rate do you find tolerable and at what leak rate do you shut the tool down. Any tricks you can share?
<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Thanks,<u></u><u></u></p>
<p class="MsoNormal">Vince<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><span style="font-family:"Microsoft Sans Serif",sans-serif">Vincent K. Luciani<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-family:"Microsoft Sans Serif",sans-serif">NanoFab Manager<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-family:"Microsoft Sans Serif",sans-serif"><a href="http://www.cnst.nist.gov/" target="_blank"><span style="color:blue">Center for Nanoscale Science and Technology</span></a><u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-family:"Microsoft Sans Serif",sans-serif">National Institute of Standards and Technology<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-family:"Microsoft Sans Serif",sans-serif">100 Bureau Drive, MS 6201<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-family:"Microsoft Sans Serif",sans-serif">Gaithersburg, MD 20899-6200 USA<u></u><u></u></span></p>
<p class="MsoNormal"><span style="font-family:"Microsoft Sans Serif",sans-serif">+1-301-975-2886<u></u><u></u></span></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
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