<html><head><meta http-equiv="Content-Type" content="text/html; charset=utf-8"></head><body style="word-wrap: break-word; -webkit-nbsp-mode: space; line-break: after-white-space;" class="">Hi Aju,<div class=""><br class=""></div><div class="">If I’m not mistaken, you’ll need hydrogen to reduce As and make it volatile so it pumps more efficiently out of your system. Perhaps it desorbs from the InP surface at 300C, but without promoting the gas phase, I think it will condense elsewhere in your ALD or pumping system. </div><div class=""><br class=""></div><div class="">There are a number of wet chemical passivations for InP surfaces that are used for pre-ALD cleans. If you’d like, please get in touch and I can share my experiences with you.</div><div class=""><br class=""><div class="">
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<div><br class=""><blockquote type="cite" class=""><div class="">On Mar 13, 2018, at 1:12 PM, Jugessur, Aju S <<a href="mailto:aju-jugessur@uiowa.edu" class="">aju-jugessur@uiowa.edu</a>> wrote:</div><br class="Apple-interchange-newline"><div class="">
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Hi all,
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<div class="">I have a user who would like to use the ALD to burn off arsenic materia (2-3 microns) on their Indinium phosphide substrate, at 300 C. Pump the arsenic away and then ALD coat Al203.</div>
<div class="">They do not want any oxidation of their samples after the removal of the arsenic, hence the suggested approach.</div>
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<div class="">Can anyone please comment on this? Both from a health/safety and the technical approach. We have an Oxford Opal.</div>
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<div class="">Thanks for your feedback.</div>
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<div class="">Regards</div>
<div class="">Aju<br class="">
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<span style="font-family: -webkit-system-font, "Helvetica Neue", Helvetica, sans-serif;" class=""><b class="">From:
</b></span><span style="font-family: -webkit-system-font, Helvetica Neue, Helvetica, sans-serif;" class="">"Zhang, Kailing" <<a href="mailto:kailing-zhang@uiowa.edu" class="">kailing-zhang@uiowa.edu</a>><br class="">
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<span style="font-family: -webkit-system-font, "Helvetica Neue", Helvetica, sans-serif;" class=""><b class="">Subject:
</b></span><span style="font-family: -webkit-system-font, Helvetica Neue, Helvetica, sans-serif;" class=""><b class="">questions about ALD</b><br class="">
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<span style="font-family: -webkit-system-font, "Helvetica Neue", Helvetica, sans-serif;" class=""><b class="">Date:
</b></span><span style="font-family: -webkit-system-font, Helvetica Neue, Helvetica, sans-serif;" class="">March 13, 2018 at 11:35:51 AM CDT<br class="">
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<span style="font-family: -webkit-system-font, "Helvetica Neue", Helvetica, sans-serif;" class=""><b class="">To:
</b></span><span style="font-family: -webkit-system-font, Helvetica Neue, Helvetica, sans-serif;" class="">"Jugessur, Aju S" <<a href="mailto:aju-jugessur@uiowa.edu" class="">aju-jugessur@uiowa.edu</a>><br class="">
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<div style="margin-top: 0px; margin-bottom: 0px;" class="">Hi Aju,</div>
<div style="margin-top: 0px; margin-bottom: 0px;" class="">I have a question about 174 ALD system. We have a plan of depositing 2-3um of arsenic on our nanowire samples, then transfer them into ALD, heat them up to ~300C to burn off arsenic and let it get pumped
out(by the pump on ALD), then depositing Al2O3 on nanowires. Please let me know what you think about this plan, if it is feasible. Thanks!</div>
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<div style="margin-top: 0px; margin-bottom: 0px;" class=""><span style="font-size: 12pt;" class="">Kailing </span></div>
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<font face="Georgia" class=""><span style="font-size: 11px;" class="">Aju Jugessur, Ph.D.<br class="">
Director, University of Iowa Microfabrication Facility (UIMF)<br class="">
Optical Science and Technology Center<br class="">
Professor Adjunct, Physics and Astronomy<br class="">
University of Iowa<br class="">
Office: IATL 202, Tel: 319-3532342<br class="">
Labs: IATL 170, 172, 174<br class="">
<a href="https://ostc.uiowa.edu/uimf" class="">https://ostc.uiowa.edu/uimf</a></span></font><br class="">
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