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<p class="MsoNormal">Hi Julia,<o:p></o:p></p>
<p class="MsoNormal"> At PSU we have our users use the following PPE when working with any wet chemicals (including developers): nitrile gloves, indirect vented safety goggles, chemical apron, and face shield.
<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Thanks,<o:p></o:p></p>
<p class="MsoNormal">Guy Lavalle<o:p></o:p></p>
<p class="MsoNormal">Remote Project Manager / Lead Etch Engineer<o:p></o:p></p>
<p class="MsoNormal">N-105 MSC Building<o:p></o:p></p>
<p class="MsoNormal">Penn State University<o:p></o:p></p>
<p class="MsoNormal">University Park, PA 16803<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Email: <a href="mailto:gpl107@psu.edu"><span style="color:#0563C1">gpl107@psu.edu</span></a><o:p></o:p></p>
<p class="MsoNormal">Office: 814-865-9339<o:p></o:p></p>
<p class="MsoNormal">Cell: 814-777-0719<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><b>From:</b> labnetwork-bounces@mtl.mit.edu <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Noah Clay<br>
<b>Sent:</b> Monday, October 29, 2018 7:39 PM<br>
<b>To:</b> Aebersold,Julia W. <julia.aebersold@louisville.edu><br>
<b>Cc:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] Handling of MF-319 Developer<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Hi Julia,<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">For MF-319 and similar developers, users at Penn wear nitrile gloves, safety glasses and a face shield.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt">-Noah<o:p></o:p></p>
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<p class="MsoNormal">Sent from my iPhone<o:p></o:p></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt"><br>
On Oct 29, 2018, at 17:34, Aebersold,Julia W. <<a href="mailto:julia.aebersold@louisville.edu">julia.aebersold@louisville.edu</a>> wrote:<o:p></o:p></p>
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<p class="MsoNormal"><span style="color:#1F497D">At our facility we primarily use MF-319 developer in puddle processing for most of photolithography processes for we do not have a track system.</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">I am reviewing our PPE for use with this material. Currently, all clients wear safety glasses and nitrile gloves at our well ventilated developer bench. I am curious to know if additional PPE is utilized by
other facilities and or butyl gloves.</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span><o:p></o:p></p>
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<p class="MsoNormal"><span style="color:#1F497D">Cheers!</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">Julia Aebersold</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">Manager, Micro/Nano Technology Center</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">University of Louisville</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">Shumaker Research Building, Room 233</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">2210 South Brook Street</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">Louisville, KY 40292</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">(502) 852-1572</span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D"> </span><o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D"><a href="https://na01.safelinks.protection.outlook.com/?url=http%3A%2F%2Flouisville.edu%2Fmicronano%2F&data=02%7C01%7Cgpl107%40psu.edu%7C71b7639aa34845677f6b08d63e608b92%7C7cf48d453ddb4389a9c1c115526eb52e%7C0%7C0%7C636764981713378120&sdata=6sKg0IxJnyu3tmftv1VtobQ%2FEgra6BRjUdJFKoYY6Ao%3D&reserved=0">http://louisville.edu/micronano/</a></span><o:p></o:p></p>
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<p class="MsoNormal"> <o:p></o:p></p>
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<p class="MsoNormal">_______________________________________________<br>
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