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<p style="margin-top:0;margin-bottom:0">We use NMP to clean our photomasks, but would love to go maskless.</p>
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<p>Cheers!</p>
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<p>Julia Aebersold, Ph.D.</p>
<p>MNTC Cleanroom Manager</p>
<p>University of Louisville</p>
<p>2210 South Brook Street</p>
<p>Shumaker Research Building, Room 233</p>
<p>Louisville, KY 40292</p>
<p>(502) 852-1572</p>
<p><a tabindex="0" href="http://louisville.edu/micronano" id="LPNoLP">http://louisville.edu/micronano/</a></p>
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<div id="divRplyFwdMsg" dir="ltr"><font face="Calibri, sans-serif" style="font-size:11pt" color="#000000"><b>From:</b> labnetwork-bounces@mtl.mit.edu <labnetwork-bounces@mtl.mit.edu> on behalf of Siva Penmetsa <sivapenmetsapr@gmail.com><br>
<b>Sent:</b> Monday, November 19, 2018 4:43:34 AM<br>
<b>To:</b> Fab Network<br>
<b>Subject:</b> [labnetwork] Photo Mask Cleaning</font>
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<div>Dear All,</div>
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<div>We are planning to upgrade our Photomask Cleaning process,</div>
<div>(currently using Acetone, IPA and Piranha).</div>
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<div>Please let us know your recommendations on the solutions, materials, scrubbing.</div>
<div>Any suggestions on the suppliers?</div>
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<div>Thanks in advance,</div>
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<div><span style="font-size:12.8px">With Regards,</span><br>
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<div>Siva Penmetsa,</div>
<div>Technology Manager,</div>
<div>National Nano Fabrication Centre(NNfC),</div>
<div>Centre for Nano Science And Engineering(CeNSE),</div>
<div>Indian Institute of Science(IISc), Bangalore</div>
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<div><a href="mailto:siva@cense.iisc.ernet.in" target="_blank"></a> </div>
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