<html><head><meta http-equiv="content-type" content="text/html; charset=utf-8"></head><body dir="auto">Mark,<div><br></div><div>I have seen blackening on the back of the wafer when clamping is poor. Most recently, this was due the e-chuck having been etched excessively and/or polymer redep on the chuck from the endpoint clean step (cleans used to be run without a wafer; we now use SiC). </div><div><br></div><div>What are your backside He leak rate set points and actual values? We run our etch process at -5C...(SPTS Rapier platform).</div><div><br></div><div>Thanks,</div><div>Noah<br><br><div id="AppleMailSignature" dir="ltr">Sent from my iPhone</div><div dir="ltr"><br>On Mar 5, 2019, at 15:44, Mark Weiler <<a href="mailto:mweiler@andrew.cmu.edu">mweiler@andrew.cmu.edu</a>> wrote:<br><br></div><blockquote type="cite"><div dir="ltr">
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Hello Everyone,
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<div class="">We have gone through seven new lip seals purchased form Orbotech/SPTS. They are often failing before we even finish qualifying the system, or within a month thereafter.
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<div class="">Our our process is stable with power and parameters not deviating over the past decade. However, I ordered the most recent batch of lip seals because the wafer seals we had been using were coming out with black residue after only a few runs…
however, the current ones do the same. Not only have the lips seals disintegrated, but the chamber lid o-ring and bottom ceramic spool o-ring have also failed with black rubber material shedding off. It’s as if they are made of Buna and not meant for this
application.</div>
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<div class="">Our process is typical Bosch with 100 sccm C4F8 and 20 sccm O2 for etching switching off with ~50 Sccm SF6 for passivation at a processing pressure of 15 mTorr, Coil power 600-800W, Platen power 100-150W, Bias voltage 50-100v (up to 200 peak-to-peak),
Platen temp at 19 degrees, Lid temp 41 degrees. Qual wafers are new bare Silicon. Etch rates are normal and stable with 10+ years of data…. we just can’t complete the work due to failing seals.</div>
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<div class="">Our chamber base pressure is between 1E-8 and 5E-8 Torr each morning. When we put in a brand new seal and run only the LUR, it passes with 0.00 mTorr/minute leak rate. That jumps to 3.00 mTorr/m after only 30 minutes of the SPTS recommended
O2 Clean… then rises as time and more runs progress. Wafers are coming out with black rings on their backsides. </div>
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<div class="">This should not be happening, and I believe it is due to incorrect material of the lip seals and o-rings. I am pinging the network, though, to see if there might be a parameter change we need to effect that may assist us.</div>
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<div class="">Have any of you seen this before?</div>
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<div class="">Best regards,</div>
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<div class="">Mark</div>
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Mark Weiler</div>
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Equipment & Facilites Manager</div>
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Clair and John Bertucci Nanotechnology Laboratory</div>
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P: 412-268-2471</div>
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<a href="http://www.nanofab.ece.cmu.edu" class="">http://www.nanofab.ece.cmu.edu</a></div>
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