<div dir="ltr"><div dir="ltr"><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066">Hi Mark Weiler,</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066">In my experience, the chamber O-rings should be Kalrez O-Rings, which can withstand very high temperatures (white color O-ring). I request you to check once if SPTS is supplying you the right one.</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066">Please check all the 4 chamber heaters (inner wall, chamber, and others) and confirm if the temperatures (~120 deg C) and the respective voltages are within the spec. Maybe one of the heaters is getting a higher voltage. </div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066">Hope this helps.</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066"><br></div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066">Thanks and best regards,</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066">vamsi</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:#000066"><br></div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Wed, Mar 6, 2019 at 6:11 AM Mark Weiler <<a href="mailto:mweiler@andrew.cmu.edu">mweiler@andrew.cmu.edu</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex">
<div dir="auto">Correction...<div><br>
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<div>In my haste to write something up and get out the door I mixed up the gas is in the problem description.</div>
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<div><span style="background-color:rgba(255,255,255,0)">Our process is typical Bosch SF6 and O2 for etching .... switching off with C4F8 for passivation...</span></div>
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<div><span style="background-color:rgba(255,255,255,0)">Mark</span></div>
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<div id="gmail-m_-337535504436174824AppleMailSignature" dir="ltr"><span style="background-color:rgba(255,255,255,0)"><b>Mark Weiler</b><br>Equipment & Facilities Manager</span>
<div><span style="background-color:rgba(255,255,255,0)">Claire and John Bertucci Nanotechnology Laboratory<br>Electrical and Computer Engineering | Carnegie Mellon University<br>
<a dir="ltr">5000 Forbes Ave., Pittsburgh, PA 15213-3890</a><br>T: <a href="tel:412.268.5430" dir="ltr" target="_blank">412.268.2471</a><br>F: <a href="tel:412.268.3497" dir="ltr" target="_blank">412.268.3497</a><br>
<a href="http://www.ece.cmu.edu/" target="_blank">www.ece.cmu.edu</a><br>
<a href="http://nanofab.ece.cmu.edu/" dir="ltr" target="_blank">nanofab.ece.cmu.edu</a></span></div>
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<div dir="ltr"><br>On Mar 5, 2019, at 18:42, Mark Weiler <<a href="mailto:mweiler@andrew.cmu.edu" target="_blank">mweiler@andrew.cmu.edu</a>> wrote:<br>
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<div dir="ltr">Hello Everyone,<div><br>
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<div>We have gone through seven new lip seals purchased form Orbotech/SPTS. They are often failing before we even finish qualifying the system, or within a month thereafter.<div><br>
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<div>Our our process is stable with power and parameters not deviating over the past decade. However, I ordered the most recent batch of lip seals because the wafer seals we had been using were coming out with black residue after only a few runs… however, the current ones do the same. Not only have the lips seals disintegrated, but the chamber lid o-ring and bottom ceramic spool o-ring have also failed with black rubber material shedding off. It’s as if they are made of Buna and not meant for this application.</div>
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<div>Our process is typical Bosch with 100 sccm C4F8 and 20 sccm O2 for etching switching off with ~50 Sccm SF6 for passivation at a processing pressure of 15 mTorr, Coil power 600-800W, Platen power 100-150W, Bias voltage 50-100v (up to 200 peak-to-peak), Platen temp at 19 degrees, Lid temp 41 degrees. Qual wafers are new bare Silicon. Etch rates are normal and stable with 10+ years of data…. we just can’t complete the work due to failing seals.</div>
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<div>Our chamber base pressure is between 1E-8 and 5E-8 Torr each morning. When we put in a brand new seal and run only the LUR, it passes with 0.00 mTorr/minute leak rate. That jumps to 3.00 mTorr/m after only 30 minutes of the SPTS recommended O2 Clean… then rises as time and more runs progress. Wafers are coming out with black rings on their backsides. </div>
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<div>This should not be happening, and I believe it is due to incorrect material of the lip seals and o-rings. I am pinging the network, though, to see if there might be a parameter change we need to effect that may assist us.</div>
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<div>Have any of you seen this before?</div>
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<div>Best regards,</div>
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<div>Mark</div>
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</blockquote></div><br clear="all"><div><br></div>-- <br><div dir="ltr" class="gmail_signature"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)" size="2"><span style="color:rgb(102,102,102)">--<br>Thanks & Best Regards,<br>-----------------<br><b>N.P.Vamsi Krishna</b></span><br></font></div><div dir="ltr"><span style="color:rgb(0,0,102);font-family:verdana,sans-serif">3D Heterogeneous Integration and System Scaling Lab,</span><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)" size="2"><br><span>Center for Nano Science and Engineering (CeNSE),<br>Indian Institute of Science(IISc), Banga<font size="2">lore.</font><br><font size="2">INDIA</font></span>-</font><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)" size="2"><span>560012</span></font></div></div></div></div></div></div></div>