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Hi Noah,
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<div>We have the first version of the 100mm STS Multiplex DRIE whereby the wafer is mechanically clamped with weighted ceramic fingers, and the wafer is lifted with a tripod. Our LUR is 0.00 mTorr/min when new, but rises to 15-20 mT/m within a week. We have
an older HBC controller that indicates 6.5 for pressure at 2.33 flow rate... I apologize but don’t know the units for either. If these values are incorrect, it could be because they were adjusted to ensure a leak rate would pass. I will need to go back over
a decade in the logs to see if any changes were made over time...but, our rates and results have been consistent.</div>
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<div>I believe the issue is material related, because we have our chamber lid o-ring and bottom ceramic o-ring failing with the same symptoms.</div>
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<div>Thanks,</div>
<div><br>
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<div>Mark</div>
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<br>
<div id="AppleMailSignature" dir="ltr"><span style="background-color: rgba(255, 255, 255, 0);"><b>Mark Weiler</b><br>
Equipment & Facilities Manager</span>
<div><span style="background-color: rgba(255, 255, 255, 0);">Claire and John Bertucci Nanotechnology Laboratory<br>
Electrical and Computer Engineering | Carnegie Mellon University<br>
<a href="x-apple-data-detectors://3/1" dir="ltr" x-apple-data-detectors="true" x-apple-data-detectors-type="address" x-apple-data-detectors-result="3/1" style="-webkit-text-decoration-color: rgba(33, 33, 33, 0.258824);">5000 Forbes Ave., Pittsburgh, PA 15213-3890</a><br>
T: <a href="tel:412.268.5430" dir="ltr" x-apple-data-detectors="true" x-apple-data-detectors-type="telephone" x-apple-data-detectors-result="3/2" style="-webkit-text-decoration-color: rgba(33, 33, 33, 0.258824);">412.268.2471</a><br>
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<a href="http://www.ece.cmu.edu/">www.ece.cmu.edu</a><br>
<a href="http://nanofab.ece.cmu.edu/" dir="ltr" x-apple-data-detectors="true" x-apple-data-detectors-type="link" x-apple-data-detectors-result="4">nanofab.ece.cmu.edu</a></span></div>
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On Mar 6, 2019, at 09:19, Noah Clay <<a href="mailto:nclay@upenn.edu">nclay@upenn.edu</a>> wrote:<br>
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<div dir="ltr">Mark,
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<div>I have seen blackening on the back of the wafer when clamping is poor. Most recently, this was due the e-chuck having been etched excessively and/or polymer redep on the chuck from the endpoint clean step (cleans used to be run without a wafer; we now
use SiC). </div>
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<div>What are your backside He leak rate set points and actual values? We run our etch process at -5C...(SPTS Rapier platform).</div>
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<div>Thanks,</div>
<div>Noah<br>
<br>
<div id="AppleMailSignature" dir="ltr">Sent from my iPhone</div>
<div dir="ltr"><br>
On Mar 5, 2019, at 15:44, Mark Weiler <<a href="mailto:mweiler@andrew.cmu.edu">mweiler@andrew.cmu.edu</a>> wrote:<br>
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<blockquote type="cite">
<div dir="ltr">Hello Everyone,
<div class=""><br class="">
</div>
<div class="">We have gone through seven new lip seals purchased form Orbotech/SPTS. They are often failing before we even finish qualifying the system, or within a month thereafter.
<div class=""><br class="">
</div>
<div class="">Our our process is stable with power and parameters not deviating over the past decade. However, I ordered the most recent batch of lip seals because the wafer seals we had been using were coming out with black residue after only a few runs…
however, the current ones do the same. Not only have the lips seals disintegrated, but the chamber lid o-ring and bottom ceramic spool o-ring have also failed with black rubber material shedding off. It’s as if they are made of Buna and not meant for this
application.</div>
<div class=""><br class="">
</div>
<div class="">Our process is typical Bosch with 100 sccm C4F8 and 20 sccm O2 for etching switching off with ~50 Sccm SF6 for passivation at a processing pressure of 15 mTorr, Coil power 600-800W, Platen power 100-150W, Bias voltage 50-100v (up to 200 peak-to-peak),
Platen temp at 19 degrees, Lid temp 41 degrees. Qual wafers are new bare Silicon. Etch rates are normal and stable with 10+ years of data…. we just can’t complete the work due to failing seals.</div>
<div class=""><br class="">
</div>
<div class="">Our chamber base pressure is between 1E-8 and 5E-8 Torr each morning. When we put in a brand new seal and run only the LUR, it passes with 0.00 mTorr/minute leak rate. That jumps to 3.00 mTorr/m after only 30 minutes of the SPTS recommended
O2 Clean… then rises as time and more runs progress. Wafers are coming out with black rings on their backsides. </div>
<div class=""><br class="">
</div>
<div class="">This should not be happening, and I believe it is due to incorrect material of the lip seals and o-rings. I am pinging the network, though, to see if there might be a parameter change we need to effect that may assist us.</div>
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<div class="">Have any of you seen this before?</div>
<div class=""><br class="">
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<div class="">Best regards,</div>
<div class=""><br class="">
</div>
<div class="">Mark</div>
<div class="">
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Mark Weiler</div>
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Equipment & Facilites Manager</div>
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