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Hello everyone,</p>
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<span style="margin:0px; font-size:12pt; font-family:"times new roman",serif; color:rgb(33,33,33); background-color:rgb(255,255,255)">I am trying to spin 350nm HSQ by double coating XR1541 6% at 2000rpm and bake at 80C between coating. However, HSQ thickness
measured by reflectance spectrum actually get thinner after the second spin and bake. I wonder if the HSQ still get dissolved again during the 2nd dispense even with 80C bake for 4min after the first coating. Any suggestion on getting over 200nm HSQ spin coated
on Si?</span></p>
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<span style="margin:0px; font-size:12pt; font-family:"times new roman",serif; color:rgb(33,33,33); background-color:rgb(255,255,255)">Best regards,</span></p>
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<span style="margin:0px; font-size:12pt; font-family:"times new roman",serif; color:rgb(33,33,33); background-color:rgb(255,255,255)">Mengdi</span></p>
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