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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Dear Xuekun,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">In general DC bias reading is a reading and depends on machine configuration and used carrier wafer. We do use a quartz carrier wafer
in our system (it has a metal coating on the backside as we have an electro-static chuck) and DC reading is quite low. Recently we switched to a sapphire carrier and we get etching. Note when you use a Si wafer (coated with oxide or not) you obtain different
etch rate on small pieces related to the loading effect and diffusion of reactants (in case of sapphire) causing higher etch rate than with Si where reactants are consumed at the Si surface.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">As Vamsi said, cleaning process with O2 does not consume the sapphire.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Regards, Fouad<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">*************************************<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Manager ANFF ACT Node<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Australian National Fabrication Facility<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Research School of Physics and Engineering<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">L. Huxley Building (#56), Mills Road, Room 4.02<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Australian National University<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">ACT 2601, Canberra, Australia<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Tel: + 61 2 6125 7174<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Mob: + 61 451 046 412<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Email:
<a href="mailto:fouad.karouta@anu.edu.au">fouad.karouta@anu.edu.au</a><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><a href="http://anff-act.anu.edu.au/">http://anff-act.anu.edu.au/</a><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><a name="_MailEndCompose"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US"><o:p> </o:p></span></a></p>
<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork-bounces@mtl.mit.edu [mailto:labnetwork-bounces@mtl.mit.edu]
<b>On Behalf Of </b>N P VAMSI KRISHNA<br>
<b>Sent:</b> Friday, 5 April 2019 4:20 PM<br>
<b>To:</b> Xuekun Lu <xklu@eng.ucsd.edu><br>
<b>Cc:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] Wafer specification requirement for RIE & DRIE cleaning recopies<o:p></o:p></span></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-family:"Tahoma",sans-serif;color:#222222">Dear Dr. Xuekun Lu,</span><span style="font-family:"Verdana",sans-serif;color:#000066"><o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-family:"Tahoma",sans-serif">I guess there may be a thick polymer deposition on the table (mechanical chuck). This polymer could be from C4F8. If someone used your tool for polymer depositions or if the plasma is turned
on without a wafer on the mechanical chuck, this can happen. </span><o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-family:"Tahoma",sans-serif">I suggest you may want to do a mild rub on the table (chuck) using IPA+DI water and see if there is any DC bias. </span><o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-family:"Tahoma",sans-serif">Thanks & best regards,</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-family:"Tahoma",sans-serif">vamsi</span><o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">On Fri, Apr 5, 2019 at 5:25 AM Xuekun Lu <<a href="mailto:xklu@eng.ucsd.edu">xklu@eng.ucsd.edu</a>> wrote:<o:p></o:p></p>
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<p class="MsoNormal">Dear colleagues,<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<div>
<p class="MsoNormal">I am sorry to borrow this thread to ask this question, but it is a related question. Please let me know if I should start a separate subject.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">We have an Oxford PlasmalabSystem 100 with ICP180. Whenever we use a insulating carrier wafer (fused silica wafer, or silicon wafer coated with thick SiO2 film), the DC bias reading would be zero. As everybody knows that this does not mean
the sample is subject to zero bias, but in our case, it seems that the sample DOES subject to zero bias. The etch result will be more isotropic with very low etch rate. This is even more a problem when running SiO2 etch with CHF3/Ar plasma, because this process
highly relies on DC bias (ion bombardment), we got almost no etching when using insulating carrier wafers. If we use silicon wafer as carrier, everything would be fine. For other owners of this machine, I am wondering if you have the same issue or it is just
our machine. I had asked Oxford for this, but had not been able to get an explanation.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Any input would be greatly appreciated!<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Thanks,<o:p></o:p></p>
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<p class="MsoNormal">Xuekun <o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<div>
<p class="MsoNormal">On Thu, Apr 4, 2019 at 9:58 AM Fabien Dauzou <<a href="mailto:fabien@edgehogtech.com" target="_blank">fabien@edgehogtech.com</a>> wrote:<o:p></o:p></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Hi Srinivasa,<o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">In the past we have been using alumina wafer carrier [1-2mm] to proceed with cleaning of RIE and DRIE.<o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">You can also use standard wafer with a photoresist or certain coating (SiO2, Cr…) to avoid wafer consumption. It should be fine with the helium backside cooling.<o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="FR">Best regards, Bien cordialement,</span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="FR"> </span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="FR">Fabien Dauzou (Jr. Eng.)</span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-US">R&D Process Engineer</span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-US"><a href="mailto:fabien@edgehogtech.com" target="_blank"><span style="color:#0563C1">fabien@edgehogtech.com</span></a></span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-US">Mob: 438-868-1657</span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-US"><a href="https://www.edgehogtech.com/" target="_blank"><span style="color:#0563C1">https://www.edgehogtech.com/</span></a></span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"><img border="0" width="157" height="89" id="gmail-m_343788791728862991m_-2899228987401812480m_8477376047344986128gmail-m_-3083859506424299423Picture_x0020_4" src="cid:image001.png@01D4EF80.836EB530"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA" style="font-size:10.0pt">780 Av. Brewster, Montreal, QC, Canada, H4C 2K1</span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA" style="font-size:8.0pt;color:#00B050">Think green, before printing this email.</span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><b><span lang="EN-US">From:</span></b><span lang="EN-US">
<a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a> <<a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a>>
<b>On Behalf Of </b>Srinivasa Reddy<br>
<b>Sent:</b> April 4, 2019 1:42 AM<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> [labnetwork] Wafer specification requirement for RIE & DRIE cleaning recopies</span><span lang="EN-CA"><o:p></o:p></span></p>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">HI,<o:p></o:p></span></p>
<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">I'm Srinivasa Reddy, Manger, Microfabrication Lab, Indian Institute of Technology, Madras, Chennai.<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">This is regarding Wafers specifications for Dummy wafers for RIE & DRIE process.<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">1. Some times we stick
<b>small prices</b> to f<b>ull 4 inch wafer</b> and do the etching process.<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Currently we are using
<b>Prime Wafers</b> ( which costly) and I'm looking to replace with Mechanical grade or Test grade wafers. <o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">2. We also do chamber cleaning runs with the wafers and this also consumes significant number of wafers. Here also want to replace the Prime wafer with Test or
Mechanical grade wafer.<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">I've doubt about the Bending/Warping or TTV or backside roughness of the wafer and It may lead to higher helium leak rate and process may abort.<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Could some one throw light on this issue<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"> <o:p></o:p></span></p>
</div>
<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA"><br clear="all">
<o:p></o:p></span></p>
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<div>
<div>
<div>
<div>
<div>
<div>
<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Thanks & Regards<o:p></o:p></span></p>
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<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Srinivasa Reddy Kuppireddi<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Project Manager
<o:p></o:p></span></p>
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<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Center for NEMS & Nano Photonics (CNNP)<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">ESB 225, Dept. of Electrical Engineering<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Indian Institute of Technology(IIT) Madras<o:p></o:p></span></p>
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<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">Chennai-600036, Indian<o:p></o:p></span></p>
</div>
<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">+91 44 2257 5493 (O)<o:p></o:p></span></p>
</div>
<div>
<p class="MsoNormal" style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto"><span lang="EN-CA">+91 789 326 8010(M)<o:p></o:p></span></p>
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<p class="MsoNormal">_______________________________________________<br>
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<p class="MsoNormal"><br clear="all">
<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">-- <o:p></o:p></p>
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<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif">----------------------------------------</span><o:p></o:p></p>
</div>
<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif">Dr. Xuekun Lu<br>
<br>
University of California, San Diego<br>
Calit2 M/C0436<br>
9500 Gilman Drive<br>
La Jolla, CA 92093-0436<br>
<br>
For Fedex Shipping:<br>
Dr. Xuekun Lu<br>
University of California, San Diego<br>
Atkinson Hall 5th Floor Front Desk<br>
9500 Gilman Drive<br>
La Jolla, CA 92093<br>
<br>
Phone: (858) 246-0411<br>
Fax: (858) 246-0408<br>
E-mail: <a href="mailto:xklu@ucsd.edu" target="_blank">xklu@ucsd.edu</a><br>
</span><span style="font-family:"Tahoma",sans-serif"><a href="https://mail.ucsd.edu/owa/redir.aspx?C=317d92da2d2640938cbc0ac31f2a741b&URL=http%3a%2f%2fnano3.calit2.net%2f" target="_blank"><span style="font-size:10.0pt">http://nano3.calit2.net/</span></a></span><o:p></o:p></p>
</div>
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</div>
<p class="MsoNormal">_______________________________________________<br>
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Thanks & Best Regards,<br>
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</span><span class="gmaildefault"><b><span style="font-size:10.0pt;font-family:"Verdana",sans-serif;color:#000066">Dr. </span></b></span><b><span style="font-size:10.0pt;font-family:"Verdana",sans-serif;color:#666666">N.P.Vamsi Krishna</span></b><span style="font-size:10.0pt;font-family:"Verdana",sans-serif;color:#000066"><br>
</span><span style="font-family:"Verdana",sans-serif;color:#000066">3D Heterogeneous Integration and System Scaling Lab,</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="font-size:10.0pt;font-family:"Verdana",sans-serif;color:#000066">Center for Nano Science and Engineering (CeNSE),<br>
Indian Institute of Science(IISc), Bangalore.<br>
INDIA-560012</span><o:p></o:p></p>
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