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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">We have had success also with Ar/O2 room temperature ion assisted e-beam depositions of ITO, resistivity was quite low and the user
is happy. We have not conducted a full process space investigation though. <o:p>
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<p class="MsoNormal"><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D;mso-fareast-language:EN-US">Regards, Owain<o:p></o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork-bounces@mtl.mit.edu <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Aebersold,Julia W.<br>
<b>Sent:</b> 10 April 2019 19:01<br>
<b>To:</b> Iulian Codreanu <codreanu@udel.edu>; bgila@ufl.edu<br>
<b>Cc:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] ITO deposition<o:p></o:p></span></p>
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<p><span style="font-family:"Calibri",sans-serif;color:black">Sometimes we will run the sample in our anneal furnace with O2 flowing if extra transparency and lower resistivity is needed.<o:p></o:p></span></p>
<p><span style="font-family:"Calibri",sans-serif;color:black"><o:p> </o:p></span></p>
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<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">Cheers!<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black"><o:p> </o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">Julia Aebersold, Ph.D.<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">MNTC Cleanroom Manager<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">University of Louisville<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">2210 South Brook Street<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">Shumaker Research Building, Room 233<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">Louisville, KY 40292<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black">(502) 852-1572<o:p></o:p></span></p>
<p><span style="font-size:10.0pt;font-family:"Tahoma",sans-serif;color:black"><a href="https://eur03.safelinks.protection.outlook.com/?url=http%3A%2F%2Flouisville.edu%2Fmicronano&data=01%7C01%7Codc1n08%40soton.ac.uk%7C1a3a47a70d354b84943408d6be0a1a34%7C4a5378f929f44d3ebe89669d03ada9d8%7C0&sdata=uxWQymzibzXvZmooBntEPerB8vCp%2F5A4Ht4VdHWz00Y%3D&reserved=0" id="LPNoLP">http://louisville.edu/micronano/</a><o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black">From:</span></b><span style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black">
<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a> <<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a>> on behalf of Brent Gila <<a href="mailto:bgila@ufl.edu">bgila@ufl.edu</a>><br>
<b>Sent:</b> Tuesday, April 9, 2019 4:14:20 PM<br>
<b>To:</b> Iulian Codreanu<br>
<b>Cc:</b> <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> Re: [labnetwork] ITO deposition</span> <o:p></o:p></p>
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<p class="MsoNormal"><span style="font-size:11.0pt">Hello Iulian,<br>
<br>
We have sputtered ITO here in our multi-user sputter tool without any <br>
indium or tin issues. However, there are some tricks to controlling the <br>
conductivity of the sputtered ITO and that involves dialing in just the <br>
right amount of O2 background in the system. We would load the ITO <br>
target overnight and run the dep first thing the following morning to <br>
ensure a low O2 and H2O background. Our tool is a KJL CMS 18 sputter <br>
tool and KJL was helpful in providing some starting points with the <br>
recipe. We had to still tweak the recipe, but that is not uncommon.<br>
<br>
Best Regards,<br>
Brent<br>
-- <br>
Brent P. Gila, PhD.<br>
Director, Nanoscale Research Facility<br>
1041 Center Drive<br>
University of Florida<br>
Gainesville, Florida 32611<br>
<a href="Tel:352-273-2245">Tel:352-273-2245</a><br>
Fax:352-846-2877<br>
email:bgila@ufl.edu<br>
<br>
<br>
<br>
<br>
On 4/9/2019 12:54 PM, Iulian Codreanu wrote:<br>
> Dear Colleagues,<br>
><br>
> We have received a number of requests to provide ITO deposition <br>
> capabilities. We have a sputterer but are concerned with the low <br>
> melting points for Indium and Tin. I am under the impression that ITO <br>
> needs a dedicated deposition system. What is your experience/advice?<br>
><br>
> Thank you,<br>
><br>
> Iulian<br>
><br>
<br>
<br>
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