<div dir="ltr">Dear All,<div><br><div><div style="margin:0px;padding:0px;border:0px;font-variant-numeric:inherit;font-variant-east-asian:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;font-family:Calibri,Arial,Helvetica,sans-serif;vertical-align:baseline;color:black">We do mask writing on<span style="margin:0px;padding:0px;border:0px;font:inherit;vertical-align:baseline;color:inherit"> </span><span style="margin:0px;padding:0px;border:0px;font:inherit;vertical-align:baseline;color:inherit">photomask</span><span style="margin:0px;padding:0px;border:0px;font:inherit;vertical-align:baseline;color:inherit"> </span>blanks of flatness 5M,7M,</div><div style="margin:0px;padding:0px;border:0px;font-variant-numeric:inherit;font-variant-east-asian:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;font-family:Calibri,Arial,Helvetica,sans-serif;vertical-align:baseline;color:black">currently due to manufacturing issues the supplier </div><div style="margin:0px;padding:0px;border:0px;font-variant-numeric:inherit;font-variant-east-asian:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;font-family:Calibri,Arial,Helvetica,sans-serif;vertical-align:baseline;color:black">says he can provide <span class="gmail-mark09x8unonp" style="margin:0px;padding:0px;border:0px;font:inherit;vertical-align:baseline;color:inherit">photomasks</span> with <span class="gmail-mark2ltya3tb9" style="margin:0px;padding:0px;border:0px;font:inherit;vertical-align:baseline;color:inherit">10M</span> flatness only.</div><div style="margin:0px;padding:0px;border:0px;font-variant-numeric:inherit;font-variant-east-asian:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;font-family:Calibri,Arial,Helvetica,sans-serif;vertical-align:baseline;color:black"><br></div><div style="margin:0px;padding:0px;border:0px;font-variant-numeric:inherit;font-variant-east-asian:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;font-family:Calibri,Arial,Helvetica,sans-serif;vertical-align:baseline;color:black"><span style="margin:0px;padding:0px;border:0px;font-style:inherit;font-variant:inherit;font-weight:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;vertical-align:baseline">Please let us to know if you have any experience writing on <span class="gmail-mark2ltya3tb9" style="margin:0px;padding:0px;border:0px;font:inherit;vertical-align:baseline;color:inherit">10M</span> flatness photomask blanks,</span><br></div><div style="margin:0px;padding:0px;border:0px;font-variant-numeric:inherit;font-variant-east-asian:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;font-family:Calibri,Arial,Helvetica,sans-serif;vertical-align:baseline;color:black"><span style="margin:0px;padding:0px;border:0px;font-style:inherit;font-variant:inherit;font-weight:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;vertical-align:baseline">with respect to critical dimensions, roughness,</span><span style="font-size:12pt;font-style:inherit;font-variant-ligatures:inherit;font-variant-caps:inherit;font-weight:inherit">any processing issues during mask(direct) writing and mask aligner(exposure) etc.,</span></div><div style="margin:0px;padding:0px;border:0px;font-variant-numeric:inherit;font-variant-east-asian:inherit;font-stretch:inherit;font-size:12pt;line-height:inherit;font-family:Calibri,Arial,Helvetica,sans-serif;vertical-align:baseline;color:black">and the trade offs(relative to 5M,7M). <span style="font-size:12pt;font-style:inherit;font-variant-ligatures:inherit;font-variant-caps:inherit;font-weight:inherit"><br></span></div><br style="color:rgb(0,0,0);font-family:Calibri,Arial,Helvetica,sans-serif;font-size:16px"><span style="color:rgb(0,0,0);font-family:Calibri,Arial,Helvetica,sans-serif;font-size:16px">Thanks in advance.</span>  <br></div><div><br><div dir="ltr" class="gmail_signature" data-smartmail="gmail_signature"><div dir="ltr"><div><div dir="ltr"><div><div dir="ltr"><div><div><span style="font-size:12.8px">With Regards,</span><br></div><div>Siva Penmetsa,</div><div>Technology Manager,</div><div>Lithography and Dry Etch,</div><div>National Nano Fabrication Centre(NNfC),</div><div>Centre for Nano Science And Engineering(CeNSE),</div><div>Indian Institute of Science(IISc), Bangalore, INDIA</div></div>
<div><a href="mailto:siva@cense.iisc.ernet.in" target="_blank"></a> </div></div></div></div></div></div></div></div></div></div>