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Please excuse me, as I help spread the word on the job opportunity
below. - J. Palmer<br>
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<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif">I am reaching out to you today to see if
you can help spread the word for a job opening at our
nanofabrication facility:
<a
href="https://uiowa.referrals.selectminds.com/jobs/core-facility-research-specialist-3341"
moz-do-not-send="true">
https://uiowa.referrals.selectminds.com/jobs/core-facility-research-specialist-3341</a>
which is equipped with these tools:<o:p></o:p></span></p>
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level1 lfo2">
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style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Direct-write Electron-Beam
Lithography (recently purchased): high speed pattern
generator<span style="letter-spacing:-.45pt">
</span>on<span style="letter-spacing:-.5pt"> </span>the<span
style="letter-spacing:-.5pt">
</span>nano-scale<span style="letter-spacing:-.55pt"> </span>with<span
style="letter-spacing:-.5pt">
</span>sub-20<span style="letter-spacing:-.5pt"> </span>nm<span
style="letter-spacing:-.45pt">
</span>resolution<span style="letter-spacing:-.5pt"> </span>patterning<span
style="letter-spacing:-.5pt">
</span>capability<span style="letter-spacing:-.5pt"> </span>and<span
style="letter-spacing:-.45pt">
</span>placement accuracy.<o:p></o:p></span></p>
<p class="MsoListParagraph"
style="margin-left:18.8pt;text-indent:-12.25pt;mso-list:l0
level1 lfo2">
<!--[if !supportLists]--><span
style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Electron Beam Lithography Proximity
effects control software: GenISys Beamer: control the
electron beam dose and electron scattering effects for
various pattern geometries and densities.<o:p></o:p></span></p>
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style="mso-margin-top-alt:0in;margin-right:.1in;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
level1 lfo2">
<!--[if !supportLists]--><span
style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Optical lithography: OAI Model 800
mask aligner with back-side alignment capabilities for
pattern exposures down to 1<span
style="letter-spacing:.25pt">
</span>µm.<o:p></o:p></span></p>
<p class="MsoListParagraph"
style="mso-margin-top-alt:.25pt;margin-right:7.05pt;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
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<!--[if !supportLists]--><span
style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Thin-film deposition: Electron-beam
deposition system (Angstrom Engineering 450) and Thermal
evaporator (Edwards Auto 306) for coating conformal thin
metal layers down to sub-10 nm thickness with high<span
style="letter-spacing:.3pt"> </span>uniformity.<o:p></o:p></span></p>
<p class="MsoListParagraph"
style="mso-margin-top-alt:.4pt;margin-right:7.0pt;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
level1 lfo2">
<!--[if !supportLists]--><span
style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Plasma etcher: Reactive ion etchers
(RIE) (Oxford PlasmaPro NGP 80) and ICP Plasma Pro S100 for
the etching of various semiconductor and insulation
materials with features on the micro- and nano-scale using
several gas chemistries. These tools offer anisotropic
etching on various materials that include glass, silicon,
III-V materials, metals with near vertical<span
style="letter-spacing:.05pt">
</span>sidewalls.<o:p></o:p></span></p>
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style="mso-margin-top-alt:.75pt;margin-right:7.0pt;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
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<!--[if !supportLists]--><span
style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Atomic Layer deposition (ALD): The
ALD system (Oxford Opal) provides the ability to precisely
coat materials at the atomic level conformally using
sequential and self-limiting surface reactions. This tool is
used to deposit a wide range <span
style="letter-spacing:-.15pt">of
</span>materials, including oxides<span
style="position:relative;top:-1.0pt;mso-text-raise:1.0pt">
such as TiO<sub>2</sub>, SiO<sub>2</sub>, ZnO, HfO<sub>2</sub>
and Nitrides, TiN, Si<sub>3</sub>N<sub>4</sub> and metals
such as Ru, Pt, with a</span> typical uniformity of < 2
% and provides excellent step coverage even inside high
aspect ratio<span style="letter-spacing:.05pt">
</span>structures.<o:p></o:p></span></p>
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style="mso-margin-top-alt:.25pt;margin-right:7.05pt;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
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style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Nanoimprint<span
style="letter-spacing:-.45pt">
</span>Lithography:<span style="letter-spacing:-.9pt"> </span>The<span
style="letter-spacing:-.55pt">
</span>tool<span style="letter-spacing:-.65pt"> </span>(Nanonex<span
style="letter-spacing:-.7pt">
</span>NX-1006)<span style="letter-spacing:-.4pt"> </span>is<span
style="letter-spacing:-.8pt">
</span>a<span style="letter-spacing:-.7pt"> </span>full<span
style="letter-spacing:-.7pt">
</span>wafer<span style="letter-spacing:-.6pt"> </span>nanoimprintor<span
style="letter-spacing:-.65pt">
</span>with thermal imprint capability. This tool is capable
of imprinting features on the micro- and nano-scale<span
style="letter-spacing:-.35pt">
</span>over<span style="letter-spacing:-.15pt"> </span>large<span
style="letter-spacing:-.35pt">
</span>areas<span style="letter-spacing:-.35pt"> </span>in<span
style="letter-spacing:-.25pt">
</span>the<span style="letter-spacing:-.3pt"> </span>centimeter<span
style="letter-spacing:-.2pt">
</span>ranges<span style="letter-spacing:-.35pt"> </span>–<span
style="letter-spacing:-.25pt">
</span>suitable<span style="letter-spacing:-.35pt"> </span>for<span
style="letter-spacing:-.15pt">
</span>low-cost<span style="letter-spacing:-.25pt"> </span>and<span
style="letter-spacing:-.25pt">
</span>large-scale fabrication.<o:p></o:p></span></p>
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style="mso-margin-top-alt:.55pt;margin-right:7.25pt;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
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<!--[if !supportLists]--><span
style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Thin-film sputtering system: The
tool (Intlvac Nanochrome 1) uses any combinations of<span
style="position:relative;top:-1.0pt;mso-text-raise:1.0pt">
RF, AC and DC magnetron sputtering cathodes to produce
thin films (including Si, SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>)
for precision coatings on a wide range of<span
style="letter-spacing:-.45pt">
</span>materials.</span><o:p></o:p></span></p>
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style="mso-margin-top-alt:0in;margin-right:7.4pt;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
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style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Plasma cleaner: The tool (Branson
3100) uses an oxygen plasma to remove thin layers of polymer
on semiconductor or insulating<span
style="letter-spacing:.2pt">
</span>materials.<o:p></o:p></span></p>
<p class="MsoListParagraph"
style="mso-margin-top-alt:0in;margin-right:7.4pt;margin-bottom:0in;margin-left:18.8pt;margin-bottom:.0001pt;text-indent:-12.25pt;mso-list:l0
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style="font-size:12.0pt;font-family:Symbol"><span
style="mso-list:Ignore">·<span style="font:7.0pt
"Times New Roman"">
</span></span></span><!--[endif]--><span
style="font-size:12.0pt">Wet-processing: Several laminar
flow wet-benches and hoods are available for wet- processing
using a wide range of solvents and acids for wet<span
style="letter-spacing:.15pt">
</span>etching.<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif">The salary and benefits are competitive.
For more information, the interested party can contact me
directly as well, and I can connect them to the hiring
manager. Thanks.<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif">Regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif">Fatima<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:12.0pt;font-family:"Times New
Roman",serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">--------------------------------------------------------------------------------------------------------------------<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Fatima Toor, Ph.D.<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Assistant Professor<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Electrical & Computer Engineering<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Physics & Astronomy<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">UI Informatics Initiative (UI3)<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Center for Computer Aided Design (CCAD)
<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Iowa CREATES and MATFab Facility<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Affiliate Member, Holden Comprehensive
Cancer Center - Experimental Therapeutics<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Office: 116 Iowa Advanced Technology
Laboratories (IATL)<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">205 N. Madison Street, The University of
Iowa, Iowa City, IA 52242-1727, USA<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Phone: +1 (319) 335-6071<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Fax: +1 (319) 335-6028<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif"><a href="https://ftoor.lab.uiowa.edu/"
moz-do-not-send="true">https://ftoor.lab.uiowa.edu/</a><o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif"><o:p> </o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Technical Group Development Chair, OSA
Board of Meetings
<o:p></o:p></span></p>
<p class="MsoNormal"><span
style="font-size:9.0pt;font-family:"Times New
Roman",serif">Associate Editor,
<a
href="https://www.spiedigitallibrary.org/journals/journal-of-photonics-for-energy?SSO=1"
moz-do-not-send="true">
SPIE Journal of Photonics for Energy</a><o:p></o:p></span></p>
<p class="MsoNormal"><o:p> </o:p></p>
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