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<p>Pradnya:</p>
<p>The image is too small to make any judgements. I am not entirely sure what EL9-PMMA is, what is the molecular weight and thickness of your film? </p>
<p>Regards,</p>
<p>Mark K Mondol <br>
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<font color="3366FF">Mark K Mondol<br>
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<div><font color="3366FF">Assistant Director NanoStructures Laboratory <br>
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<div><font color="3366FF">And <br>
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<div><font color="3366FF">Facility Manager Scanning Electron Beam Lithography Facility
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<div><font color="3366FF">Bldg 36 Room 229 <br>
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<div><font color="3366FF"> mondol@mit.edu <br>
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<div><font color="3366FF">office - 617-253-9617 <br>
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<div><font color="3366FF">cell - 617-224-8756</font></div>
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<div id="divRplyFwdMsg" dir="ltr"><font style="font-size:11pt" face="Calibri, sans-serif" color="#000000"><b>From:</b> labnetwork-bounces@mtl.mit.edu <labnetwork-bounces@mtl.mit.edu> on behalf of Pradnya Chabbi <pradnya.chabbi@gmail.com><br>
<b>Sent:</b> Friday, November 15, 2019 7:08 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] e-beam evaporation after e-beam lithography</font>
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<div dir="ltr">Dear all,
<div>We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. </div>
<div>This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the root cause. Attaching
an image below</div>
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<div>Has anyone else faced similar problems?</div>
<div>Did you manage to troubleshoot the issue and find a solution?</div>
<div>Kindly let us know.</div>
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<div><img alt="image.png" width="146" height="103" src="cid:ii_k303ispy1"><br>
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<div>Thanks & regards<br>
Pradnya<br>
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Process Technologist,<br>
CEN, IITBNF, Electrical Engg Dept, Annexe,<br>
IIT Bombay, Mumbai, Powai- 400076<br>
Contact - 09420391187(M)<br>
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