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<p class="MsoNormal">Pradnya,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">This is a common issue. Are you using Ebeam evaporation to coat the ebeam resist coated samples?<o:p></o:p></p>
<p class="MsoNormal">If yes, the scattered electrons may be exposing your ebeam resist as well, resulting in what you observe on your samples.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Aju<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Aju Jugessur Ph.D. IEEE Sr. Member<o:p></o:p></p>
<p class="MsoNormal">Director, Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC)<o:p></o:p></p>
<p class="MsoNormal">Engineering Staff Council Member (Communications and Outreach)
<o:p></o:p></p>
<p class="MsoNormal">Discovery Learning Center<o:p></o:p></p>
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<p class="MsoNormal"><b><span style="color:#1F497D">University of Colorado Boulder | </span></b><b><span style="color:#B39C11">College of Engineering & Applied Science</span></b><span style="color:black"><o:p></o:p></span></p>
<p class="MsoNormal" style="margin-bottom:12.0pt"><span style="color:#1F497D">1111 Engineering Drive – 1B09 DLC <b>|</b> Boulder, CO 80309-0422 <b>|</b> <b>P:</b> 303.735.5019<b>| F:</b> 303.492.2199<o:p></o:p></span></p>
<p class="MsoNormal" style="margin-bottom:12.0pt"><span style="color:#1F497D"><a href="https://www.colorado.edu/facility/cosinc"><span style="color:#0563C1">https://www.colorado.edu/facility/cosinc</span></a><o:p></o:p></span></p>
<p class="MsoNormal" style="margin-bottom:12.0pt"><span style="color:#1F497D">E-mail:
<a href="mailto:aju.jugessur@colorado.edu"><span style="color:#0563C1">aju.jugessur@colorado.edu</span></a></span><b><span style="font-size:8.5pt;font-family:-webkit-standard;color:black">
</span></b><span style="color:#1F497D"><o:p></o:p></span></p>
<p class="MsoNormal"><b><span style="font-size:8.5pt;font-family:-webkit-standard;color:black">Signature-Strengths: Focus, Activator, Futuristic, Strategic, Achiever<br>
(CliftonStrengths)<o:p></o:p></span></b></p>
<p class="MsoNormal"><b><o:p> </o:p></b></p>
<p class="MsoNormal" style="margin-bottom:12.0pt"><span style="color:#1F497D"><img border="0" width="294" height="60" style="width:3.0625in;height:.625in" id="Picture_x0020_2" src="cid:image001.jpg@01D59B9A.B649B3D0" alt="signature_1381777236"><o:p></o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:12.0pt;color:black">From: </span></b><span style="font-size:12.0pt;color:black"><labnetwork-bounces@mtl.mit.edu> on behalf of Pradnya Chabbi <pradnya.chabbi@gmail.com><br>
<b>Date: </b>Friday, November 15, 2019 at 5:57 AM<br>
<b>To: </b>"labnetwork@mtl.mit.edu" <labnetwork@mtl.mit.edu><br>
<b>Subject: </b>[labnetwork] e-beam evaporation after e-beam lithography<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Dear all, <o:p></o:p></p>
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<p class="MsoNormal">We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. <o:p></o:p></p>
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<p class="MsoNormal">This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the
root cause. Attaching an image below<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Has anyone else faced similar problems?<o:p></o:p></p>
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<p class="MsoNormal">Did you manage to troubleshoot the issue and find a solution?<o:p></o:p></p>
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<p class="MsoNormal">Kindly let us know.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Thanks & regards<br>
Pradnya<br>
-------------------------------------------<br>
Process Technologist,<br>
CEN, IITBNF, Electrical Engg Dept, Annexe,<br>
IIT Bombay, Mumbai, Powai- 400076<br>
Contact - 09420391187(M)<o:p></o:p></p>
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