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<p class="MsoNormal"><span lang="EN-US">Hi Pradnya,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">I have experienced this problem in the past and in fact it was discussed in good detail on Labnetwork earlier this year in the thread “</span>Blistering of metal film stack on PMM<span style="color:black">A<span class="apple-converted-space">”.</span></span><o:p></o:p></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><a href="https://mtl.mit.edu/pipermail/labnetwork/2019-February/thread.html#start">https://mtl.mit.edu/pipermail/labnetwork/2019-February/thread.html#start</a><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Long story short, it could be due to excessive sample temperature or bombardment with electrons (scattered from your E-gun) or X-rays. There are a number of solutions to this problem such as:<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<ul style="margin-top:0cm" type="disc">
<li class="MsoListParagraph" style="margin-left:0cm;mso-list:l0 level1 lfo1"><span lang="EN-US">Increasing source to sample distance<o:p></o:p></span></li><li class="MsoListParagraph" style="margin-left:0cm;mso-list:l0 level1 lfo1"><span lang="EN-US">Avoiding carbon contamination in the crucible (avoiding “Fabmate” crucible liners for Gold)<o:p></o:p></span></li><li class="MsoListParagraph" style="margin-left:0cm;mso-list:l0 level1 lfo1"><span lang="EN-US">Deflecting electrons away from the sample using electrostatic or magnetic methods<o:p></o:p></span></li><li class="MsoListParagraph" style="margin-left:0cm;mso-list:l0 level1 lfo1"><span lang="EN-US">Increasing deposition rate to reduce time sample is being bombarded by electrons<o:p></o:p></span></li></ul>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Best of luck!<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">-Nathan<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">-- <o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">Nathan Nelson-Fitzpatrick PhD<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">Nanofabrication Process & Characterization Engineering Manager<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">Quantum-Nano Fabrication and Characterization Facility (QNFCF)<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">Office of Research<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">University of Waterloo<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">200 University Avenue West, Waterloo, ON N2L 3G1<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">P: 519-888-4567 ext. 31796<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black">C: 226-218-3206<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black"><a href="https://fab.qnc.uwaterloo.ca"><span style="color:#0563C1">https://fab.qnc.uwaterloo.ca</span></a><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-family:"Verdana",sans-serif;color:black"><img border="0" width="218" height="81" style="width:2.2708in;height:.8437in" id="Picture_x0020_1" src="cid:image001.png@01D59B96.1DE8E6A0" alt="/Users/nnelsonf/Desktop/university-of-waterloo-logo-esig.png"><o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span style="font-size:12.0pt;color:black">From: </span></b><span style="font-size:12.0pt;color:black"><labnetwork-bounces@mtl.mit.edu> on behalf of Pradnya Chabbi <pradnya.chabbi@gmail.com><br>
<b>Date: </b>Friday, November 15, 2019 at 8:00 AM<br>
<b>To: </b>"labnetwork@mtl.mit.edu" <labnetwork@mtl.mit.edu><br>
<b>Subject: </b>[labnetwork] e-beam evaporation after e-beam lithography<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Dear all, <o:p></o:p></p>
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<p class="MsoNormal">We are trying to deposit Ni-10nm and Au-50nm on top patterned EL9-PMMA e-beam lithography sample for liftoff. But the deposited film is grainy and agglomerated. <o:p></o:p></p>
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<p class="MsoNormal">This problem does not occur with photolitithography resists or for any other depositions. It only arises in case of samples that have undergone e-beam lithography and have patterned e-beam resist on top. We are unable to troubleshoot the
root cause. Attaching an image below<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Has anyone else faced similar problems?<o:p></o:p></p>
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<p class="MsoNormal">Did you manage to troubleshoot the issue and find a solution?<o:p></o:p></p>
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<p class="MsoNormal">Kindly let us know.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><img border="0" width="146" height="103" style="width:1.5208in;height:1.0729in" id="_x0000_i1025" src="cid:image002.png@01D59B96.1DE8E6A0" alt="image.png"><o:p></o:p></p>
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<p class="MsoNormal"><br>
-- <o:p></o:p></p>
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<p class="MsoNormal">Thanks & regards<br>
Pradnya<br>
-------------------------------------------<br>
Process Technologist,<br>
CEN, IITBNF, Electrical Engg Dept, Annexe,<br>
IIT Bombay, Mumbai, Powai- 400076<br>
Contact - 09420391187(M)<o:p></o:p></p>
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