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<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Dear Jerry,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Though I have never etched these materials the best way to check the adequate chemistry for dry etching is to look in the Handbook, Section “Physical Constants of compounds” at the melting/boiling
points of the possible etching products. You cannot etch a compound if etching products are not volatile.
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Most common chemistries used in dry etching are: chlorinated, fluorinated or a mixture of H2/CH4.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">S and Se products with fluorine are very volatile however ZnF2 is not volatile<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Best etch for zinc is CH4/H2 with organic compound of zinc very volatile.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Am not sure if you mix the two chemistries like SF6 + CH4 and you find a regime where Zn is combined with organic CH3 group and S or Se is combined with F then you may get a decent etch. Maybe using
something like CHF3 may work providing CH group reacts with Zn and F with S/Se.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Of course a chlorinated chemistry would do the job but as boiling point of ZnCl2 is relatively high you need to ehat the table to 180-200°C and work at low pressure to increase the volatility while
S/SE chlorides are quite volatile.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Hope this helps,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Fouad</span><o:p></o:p></p>
<p class="MsoNormal">*************************************<o:p></o:p></p>
<p class="MsoNormal">Manager ANFF ACT Node<o:p></o:p></p>
<p class="MsoNormal">Australian National Fabrication Facility<o:p></o:p></p>
<p class="MsoNormal">Research School of Physics<o:p></o:p></p>
<p class="MsoNormal">L. Huxley Building (#56), Mills Road, Room 4.02<o:p></o:p></p>
<p class="MsoNormal">Australian National University<o:p></o:p></p>
<p class="MsoNormal">ACT 2601, Canberra, Australia<o:p></o:p></p>
<p class="MsoNormal">Tel: + 61 2 6125 7174<o:p></o:p></p>
<p class="MsoNormal">Mob: + 61 451 046 412<o:p></o:p></p>
<p class="MsoNormal"><span style="color:#1F497D">Email: <a href="mailto:fouad.karouta@anu.edu.au">
<span style="color:blue">fouad.karouta@anu.edu.au</span></a><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:#1F497D"><a href="http://anff-act.anu.edu.au/"><span style="color:blue">http://anff-act.anu.edu.au/</span></a><o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US">From:</span></b><span lang="EN-US"> labnetwork-bounces@mtl.mit.edu <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Shepard, Jeremiah J<br>
<b>Sent:</b> Thursday, 13 February 2020 7:42 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Cc:</b> Raghunathan, Nithin <nithin@purdue.edu>; Dilley, Neil R <ndilley@purdue.edu><br>
<b>Subject:</b> [labnetwork] Dry etching Zinc Sulfide and/or Zinc Selenide bulk samples<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><span lang="EN-US">Does anyone have experience etching Zinc Sulfide and Zinc Selenide?<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">It appears chemistry would involve BCL3.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">My primary concern is chamber contamination, any experience or thoughts? Thank you in advance!<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Thank you,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Jerry Shepard<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Research Engineer<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Purdue University<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Birck Nanotechnology Center<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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