<div dir="ltr">I would expect that a CCP may be less susceptible to process shift in this case, at least in my experience redeposition onto a cathode is not nearly as detrimental as onto a coil ceramic (as in the case of ICP). And as was already mentioned, it's unlikely to be completely volatile.<div><br></div><div>I'll also add that at the LNF, we decided a few years ago that we would not allow any selenides into any system that has a fluorine gas plumbed. Selenium fluorides are highly toxic (SeF6 has an IDLH of 2 ppm), and we were concerned that even if the gas isn't used in that specific etch, in theory there could be reactions with any fluorinated chamber wall deposition from a previous process. This may be overkill (and I'm curious what others think), but that was the decision we made.</div><div><br></div><div>We'll be moving pretty much all of our chalcogenide processes to our ion mill (as well as all other materials with predominantly nonvolatile etch byproducts).</div><div><br></div><div>-Kevin</div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Fri, Feb 14, 2020 at 8:00 AM Demis D. John <<a href="mailto:demis@ece.ucsb.edu">demis@ece.ucsb.edu</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div class="gmail_default" style="font-family:"times new roman",serif;font-size:large">We have a relatively successful recipe which works with both ZnS & ZnSe:</div><div class="gmail_default" style="font-family:"times new roman",serif;font-size:large"><a href="https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_Etching_Recipes#ZnS_Etching_.28RIE_2.29" target="_blank">https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_Etching_Recipes#ZnS_Etching_.28RIE_2.29</a><br></div><div class="gmail_default" style="font-family:"times new roman",serif;font-size:large">– Methane/Hydrogen RIE etch.</div><div class="gmail_default" style="font-family:"times new roman",serif;font-size:large"><br></div><div class="gmail_default" style="font-family:"times new roman",serif;font-size:large">This is on one of our older Capacitive RIE systems: <a href="https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_2_(MRC)" target="_blank">https://wiki.nanotech.ucsb.edu/wiki/index.php/RIE_2_(MRC)</a></div><div class="gmail_default" style="font-family:"times new roman",serif;font-size:large">We do have some very sensitive etches on this tool, and long ZnS etches did not appear to cause any visible problems to those.</div><div><div dir="ltr"><div dir="ltr"><div><div dir="ltr"><div><div dir="ltr"><div><div dir="ltr"><div style="font-family:"times new roman",serif"><font size="4">-- Demis</font></div><div style="font-family:"times new roman",serif"><font size="4"><br></font></div><div style="font-family:"times new roman",serif"><font size="4">----------------------------------------</font></div><div style="font-family:"times new roman",serif"><font size="4"> <a href="mailto:demis@ucsb.edu" target="_blank"><font color="#1155cc">demis@ucsb.edu</font></a></font></div><div style="font-family:"times new roman",serif"><div style="font-family:"times new roman",serif"><i><font size="4"> Process Scientist Manager</font></i></div></div><div style="font-family:"times new roman",serif"><font size="4"> <a href="https://www.nanotech.ucsb.edu/" target="_blank"><font color="#1155cc">UCSB Nanofabrication Facility</font></a></font></div><div style="font-family:"times new roman",serif"><div style="font-family:"times new roman",serif"><font size="4">----------------------------------------</font></div></div><div style="font-family:"times new roman",serif;font-size:small"><br></div></div></div></div></div></div></div></div></div></div><br></div></div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Thu, Feb 13, 2020 at 5:43 PM Aebersold,Julia W. <<a href="mailto:julia.aebersold@louisville.edu" target="_blank">julia.aebersold@louisville.edu</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex">
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<p class="MsoNormal"><span style="color:rgb(31,73,125)">We haven’t etched that material, but any plasma processing with BCL3 we raise the processing temp of the cooling water. BCL3 loves to condense at room temps, so we take our chiller up to 35 degrees C to make
sure it stays in vapor form. And wrap the gas lines with heat tape.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)"><u></u> <u></u></span></p>
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<p class="MsoNormal"><span style="color:rgb(31,73,125)">Cheers!<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">Julia Aebersold, Ph.D.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">Manager, Micro/Nano Technology Center<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">University of Louisville<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">Shumaker Research Building, Room 233<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">2210 South Brook Street<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">Louisville, KY 40292<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">(502) 852-1572<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)"><u></u> <u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)"><a href="http://louisville.edu/micronano/" target="_blank"><span style="color:rgb(5,99,193)">http://louisville.edu/micronano/</span></a><u></u><u></u></span></p>
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<p class="MsoNormal"><span style="color:rgb(31,73,125)"><u></u> <u></u></span></p>
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<p class="MsoNormal"><b>From:</b> <a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a> [mailto:<a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a>]
<b>On Behalf Of </b>Shepard, Jeremiah J<br>
<b>Sent:</b> Wednesday, February 12, 2020 3:42 PM<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a><br>
<b>Cc:</b> Raghunathan, Nithin <<a href="mailto:nithin@purdue.edu" target="_blank">nithin@purdue.edu</a>>; Dilley, Neil R <<a href="mailto:ndilley@purdue.edu" target="_blank">ndilley@purdue.edu</a>><br>
<b>Subject:</b> [labnetwork] Dry etching Zinc Sulfide and/or Zinc Selenide bulk samples<u></u><u></u></p>
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<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Does anyone have experience etching Zinc Sulfide and Zinc Selenide?<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">It appears chemistry would involve BCL3.<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">My primary concern is chamber contamination, any experience or thoughts? Thank you in advance!<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Thank you,<u></u><u></u></p>
<p class="MsoNormal">Jerry Shepard<u></u><u></u></p>
<p class="MsoNormal">Research Engineer<u></u><u></u></p>
<p class="MsoNormal">Purdue University<u></u><u></u></p>
<p class="MsoNormal">Birck Nanotechnology Center<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
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</blockquote></div><br clear="all"><div><br></div>-- <br><div dir="ltr" class="gmail_signature"><div dir="ltr"><div><div dir="ltr"><div>Kevin Owen<div>Senior Engineer in Research</div><div>Operations Group, Lurie Nanofabrication Facility</div><div>University of Michigan</div><div>(734) 545-4014</div></div></div></div></div></div>