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<p class="xmsonormal">Dear Labnetwork Community,<o:p></o:p></p>
<p class="xmsonormal"> <o:p></o:p></p>
<p class="MsoNormal">We are trying to get more information about appropriate venting precautions (e.g. proper exhaust abatement
<span class="st">system</span> or just heated ALD trap) for Thermal Atomic Layer Deposition System configured for alumina, hafnia and titania on Si, GaAs, and InP substrates. We would appreciate if you could share your experiences and solutions at your facilities.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Thank you,<o:p></o:p></p>
<p class="MsoNormal">Zuzanna Lewicka<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="xxmsobodytext">Senior Research Specialist<o:p></o:p></p>
<p class="xxmsobodytext">Princeton Institute for the Science and Technology of Materials (PRISM) Cleanroom<o:p></o:p></p>
<p class="xxmsobodytext">Email:<span class="xxmsohyperlink"><span style="font-family:"Calibri",sans-serif;color:black"> </span></span><a href="https://owa.princeton.edu/owa/redir.aspx?C=_objl9mq7yUMTgAiqvOi4fXDy7oF3uDvC7guzRPqpQi1k7GZDK_VCA..&URL=mailto%3azlewicka%40princeton.edu" target="_blank" id="LPlnk845421"><span style="font-family:"Calibri",sans-serif">zlewicka@princeton.edu</span></a><o:p></o:p></p>
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