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<p class="MsoNormal">Dear all,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">We have received requests to run the pseudo-Bosch (SF6+C4F8) process at -5C to -50C on Oxford ICP-RIE 100s and I am very concerned because:<o:p></o:p></p>
<ul style="margin-top:0in" type="disc">
<li class="MsoListParagraph" style="margin-left:0in;mso-list:l0 level1 lfo3">Oxford suggests to run it at >5C since condensation might affect pumping speed;<o:p></o:p></li><li class="MsoListParagraph" style="margin-left:0in;mso-list:l0 level1 lfo3">The C4F8 in the process might condense on the sample in low temperature;<o:p></o:p></li><li class="MsoListParagraph" style="margin-left:0in;mso-list:l0 level1 lfo3">As I understand the cryogenic Si etch uses SF6+O2, not the C4F8.<o:p></o:p></li></ul>
<p class="MsoNormal">I am wondering if you have any experience running this process in low temperatures, below zero degree in particular.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Any comment is appreciated.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Thank you & stay safe.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Best,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Gloria<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><b><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">Wenlan (Gloria) Qiu</span></b><span lang="EN-US" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">Senior Process Engineer | Research & Prototype Foundry</span><span lang="EN-US" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">Core Research Facilities | Research Portfolio</span><span lang="EN-US" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><o:p></o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">THE UNIVERSITY OF SYDNEY</span></b><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D"><br>
Level 4, Sydney Nanoscience Hub A31 | The University of Sydney | NSW | 2006<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#404040">M +61 452 493328</span><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#525252">
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E</span></b><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">
</span><a href="mailto:gloria.qiu@sydney.edu.au"><b><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#0563C1">gloria.qiu@sydney.edu.au</span></b></a><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">
| <b>W</b></span><a href="https://sydney.edu.au/research/facilities/research-and-prototype-foundry.html"><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#0563C1;text-decoration:none"> </span><b><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#0563C1">Research
and Prototype Foundry</span></b></a><span lang="EN-US" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="font-size:8.0pt;font-family:"Arial",sans-serif;color:#4D4D4D">CRICOS 00026A</span><span lang="EN-US" style="font-size:10.0pt;font-family:"Arial",sans-serif;color:black"><o:p></o:p></span></p>
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