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<p class="MsoNormal"><span style="mso-fareast-language:EN-US">Hi Pallavi,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">10min might be long for the gas to proper evacuate and that’s why you will observed self-masking hence black-silicon.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US">You might need to do some break in your etching recipe to see what happen.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="FR">Best regards, Bien cordialement,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="FR"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="FR">Fabien Dauzou<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Photovoltaic Enthusiast | Edgehog Eng./Entrepreneur | Cleantech Optimist<o:p></o:p></span></p>
<p class="MsoNormal"><a href="mailto:fabien@edgehogtech.com"><span lang="EN-US" style="color:#0563C1">fabien@edgehogtech.com</span></a><span lang="EN-US"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Mob: 438-868-1657<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:8.0pt">780 Av. Brewster, RC-016, Montreal, QC, Canada, H4C 2K1<o:p></o:p></span></p>
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<p class="MsoNormal"><a href="https://www.edgehogtech.com/"><span lang="EN-US" style="font-size:8.0pt;color:blue">https://www.edgehogtech.com</span></a><span lang="EN-US" style="font-size:8.0pt">||</span><a href="https://www.linkedin.com/company/edgehog"><span style="font-size:8.0pt;color:blue">https://www.linkedin.com/company/edgehog</span></a><span style="font-size:8.0pt"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:8.0pt;color:#00B050">Think green, before printing this email.</span><o:p></o:p></p>
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<p class="MsoNormal"><span style="mso-fareast-language:EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US">From:</span></b><span lang="EN-US"> labnetwork-bounces@mtl.mit.edu <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Pallavi Sharma<br>
<b>Sent:</b> July 27, 2020 12:02 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] Deep Reactive Ion Etch Problems<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">Hello all,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">I am having problem with anisotropic etching of silicon by Deep Reactive ion etch. Grass or black silicon is the issue all the time, attaching some of the SEM pictures of the sample. Every recipe
I tried to fine tune result in grass formation, even as the process initiates in tool wafer surface starts to turn brown and ultimately black. I tried varying SF6 gas flow, Bias power, Substrate temperature but every time I see is highly dense grass with no
clean surface. <o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">Any help will be greatly appreciated.<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">Thank you,<br>
Pallavi<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black"><o:p> </o:p></span></p>
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