<html><head></head><body><div class="ydpeb772d7fyahoo-style-wrap" style="font-family: Helvetica Neue, Helvetica, Arial, sans-serif; font-size: 10px;"><div style=""><div dir="ltr" data-setdir="false" style=""><font size="3">Sa'ad,...... here is my two cents......SPR-955 is a high thruput I-line photo resist (365nm) for optimum results you want to a match a lithography tool that has I-line exposing light source, G-line 436nm or H-line 405 nm do not give you optimum results in many cases if used with a none matched resist,, also the SPR is tailored to be processed with wet chemistry. Photo resists are usually tailored for best results to be processed with wet or dry chemistry.</font></div><div dir="ltr" data-setdir="false" style=""><font size="3"><br></font></div><div dir="ltr" data-setdir="false" style=""><font size="3">I hope this helps, Regards.</font></div><div style="font-size: 10px;"><br></div><div style="font-size: 10px;"><br></div><div style="font-size: 10px;"><br></div><div class="ydpeb772d7fsignature" style="font-size: 10px;">Mario A. Portillo Sr.<br>HIGH'born Technology USA Inc..<br>Semiconductor Equipment Services<br>8130 Glades Road, #229<br>Boca Raton, FL 33434<br>561 470-1975 office<br>561 504-0244 cell<br>hbtusainc@yahoo.com<br>www.hbtusainc.com</div></div>
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On Monday, December 21, 2020, 09:13:53 AM GMT+8, Tony Whipple <whipp003@umn.edu> wrote:
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<div><div id="yiv6470357037"><div dir="ltr"><div>Hello Sa'ad;</div><div><br></div><div>As Robert said, using a stepper would be a large help. We have used SPR-955 before and was able to have nice vertical sidewalls at half micron lines, but was with a stepper.<br></div><div>One other item that we did was a post exposure bake, which was done between your steps 6 and 7. If limited to a contact aligner, then hard or vacuum contact are worth <br></div><div>trying if you have not already done that.<br></div><div>Good luck, Tony W.<br></div><div id="yiv6470357037m_311964083070025090DAB4FAD8-2DD7-40BB-A1B8-4E2AA1F9FDF2"><br>
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</tbody></table><a href="#m_311964083070025090_DAB4FAD8-2DD7-40BB-A1B8-4E2AA1F9FDF2" target="_blank" rel="noreferrer noopener"></a></div></div><br><div class="yiv6470357037gmail_quote"><div dir="ltr" class="yiv6470357037gmail_attr">On Thu, Dec 17, 2020 at 12:56 PM Sa'ad H <<a ymailto="mailto:saad_m_hassan@hotmail.com" href="mailto:saad_m_hassan@hotmail.com" target="_blank" rel="noreferrer noopener">saad_m_hassan@hotmail.com</a>> wrote:<br></div><blockquote class="yiv6470357037gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex;">
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Good Morning Everyone,</div>
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I trust everyone is well. I have been working on defining lithographic features that are lines separated by trenches both of which are 800nm wide.
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I am getting adequate resolution, i.e, the lines are very close to spec. But the sidewalls slope significantly as can be seen in the attached picture.</div>
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My wafer is fabricated as follows:</div>
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<li> Bare Silicon Wafer</li><li>HMDS</li><li>Backside Antireflective Coating (XHiRC-16)</li><li>SPR-955 - 6000 rpm spin - PR thickness - 800nm</li><li>Bake 90 Celsius for 90 seconds<br>
</li><li>Exposure - 125 mJ/cm2 in a contact aligner</li><li>Development 1 minute with ultrasonic</li></ol>
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<div>Does anyone know how I can achieve nice vertical sidewalls? <br>
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<div>Cheers,</div>
<div>Sa'ad<br>
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