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Hi Bill, <br>
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We have a characterized PECVD SiNx recipe that can get close to those stress specifications but we would have to verify the index of refraction. Specifications/data are here:
<a href="https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf" id="LPlnk">
https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf</a>
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<a target="_blank" id="LPUrlAnchor319082" href="https://louisville.edu/micronano/files/documents/characterization-data/PECVDSiliconNitrideStressControlandRateData.pdf" style="text-decoration: none; color:var(--themePrimary);">Stress Measurements and Rates in
the Oxford PECVD</a></div>
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Stress Measurements and Rates in the Oxford PECVD Daniel Porter and Michael Martin Feb. 13, 2012</div>
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louisville.edu</div>
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Regards, <br>
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Michael <br>
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<div id="divRplyFwdMsg" dir="ltr"><font face="Calibri, sans-serif" style="font-size:11pt" color="#000000"><b>From:</b> labnetwork-bounces@mtl.mit.edu <labnetwork-bounces@mtl.mit.edu> on behalf of Bill Kiether <wjkiethe@ncsu.edu><br>
<b>Sent:</b> Friday, February 19, 2021 9:30 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu <labnetwork@mtl.mit.edu><br>
<b>Cc:</b> Philip Barletta <pbarlet@ncsu.edu><br>
<b>Subject:</b> [labnetwork] Low-Stress silicon nitride via LPCVD capability</font>
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<div dir="ltr">Hello all,
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<div>We have a customer that needs some specific capabilities for low stress Silicon Nitride that we can't provide right now. Does anyone have a well established process that can reach these values. The specs are:</div>
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<div>4" wafers </div>
Target thicknesses are 500A and 1500A,
<div>with stress 200MPa +/- 50 and refractive index 2.15 +/- 0.05</div>
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<div>Please send me your contact info and I will pass it along. </div>
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