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<p>Dear Labnetwork experts,<br>
</p>
<p>We're looking to purchase an LPCVD system to deposit SiN and SiO2
for silicon photonics. We have low volumes but occasionally need
to deposit on 200mm wafers. Ideally, we would prefer a vertical
system that only needs to accommodate one 200 mm wafer on occasion
while most of the work will be on multiple smaller samples (eg
25x25mm).</p>
<p>Any suggestions or recommendations are welcomed.</p>
<p>Mario<br>
</p>
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<img src="cid:part1.74DA5399.687DFC6F@physics.ubc.ca" border="0"></div>
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