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<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">Dear Colleagues,<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
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<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">The Department of Electronics (ELEC) at Carleton University, Ottawa, Canada, together with the National Research Council (NRC) of Canada, is accepting applications for a Postdoctoral Research
Fellow position dedicated to the design and fabrication of integrated quantum optical devices in a silicon nitride platform. The applicant should have research experience in material science, nanofabrication and photonic devices, supported by a good publication
record. Knowledge of quantum optics will be considered an asset. The successful applicant will work with our Carleton-NRC team to first develop the silicon nitride materials platform followed by the design, nanofabrication and characterization of devices such
as frequency combs and cavity resonators for applications in quantum key distribution and the enhancement rates of non-classical light sources. This position is supported by an external grant and is for a period of 2 years.<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">Candidates must have completed a Ph.D. degree in Engineering Physics, Electrical Engineering, Physics or in a closely related field. The candidate should have direct research experience and skills
in the following areas:<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"> <o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">ˇ film deposition and growth of dielectrics and semiconductors, particularly in the area of low-pressure chemical vapor deposition (LPCVD)<o:p></o:p></span></p>
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<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">ˇ cleanroom processing and fabrication of photonic devices such as dry and wet etching, lithography and layout techniques, etc.<o:p></o:p></span></p>
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<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">ˇ material characterization techniques such as ellipsometry and film stress analysis<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">ˇ coupled-mode, optical waveguide and micro-resonator theory and design <o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">The successful applicant will collaborate closely and conduct research with personnel at all levels within the Carleton and NRC groups. Additionally, the Fellow is expected to assist with conference
and journal publications and reports. Excellent written and oral communication skills are essential to the position. Applications should include a CV, publication history and a cover letter clearly outlining how their part research and experience provide the
necessary qualifications. Additionally, contact information for 3 references should be available upon request.<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">Carleton University is committed to EDI and fostering diversity within its community as a source of excellence, cultural enrichment, and social strength. We therefore welcome applications from
underrepresented groups including, but not limited to: women; visible minorities; First Nations, Inuit and Métis peoples; persons with disabilities; and persons of any sexual orientation, gender identity and/or expression. Carleton understands that career
paths vary. Legitimate career interruptions will in no way prejudice the assessment process and their impact will be carefully considered.<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"> <o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline;box-sizing: inherit;color:rgba(0, 0, 0, 0.9);font-variant-ligatures: normal;font-variant-caps: normal;orphans: 2;text-align:start;widows: 2;-webkit-text-stroke-width: 0px;text-decoration-thickness: initial;text-decoration-style: initial;text-decoration-color: initial;word-spacing:0px">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">Please direct enquires and applications to Professor Connor Kupchak (connor.kupchak@carleton.ca) and Dr. Khaled Mnaymneh (<a href="mailto:khaled.mnaymneh@nrc-cnrc.gc.ca">khaled.mnaymneh@nrc-cnrc.gc.ca</a>).<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif"><o:p> </o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">Best regards,<o:p></o:p></span></p>
<p style="margin:0cm;margin-bottom:.0001pt;background:white;vertical-align:baseline">
<span style="font-size:10.5pt;font-family:"Segoe UI",sans-serif">Khaled.<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">--<o:p></o:p></span></p>
<p class="MsoNormal"><b><span lang="EN-US" style="mso-fareast-language:EN-CA">Dr Khaled Mnaymneh, PEng<o:p></o:p></span></b></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">Advanced Fabrication Technology<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">Emerging Technologies Division<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">National Research Council Canada<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">1200 Montreal Road, Bldg M50, IPF RM130<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">Ottawa, Ontario, Canada K1A 0R6<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">Phone: (613) 949 1725<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="mso-fareast-language:EN-CA">khaled.mnaymneh@nrc-cnrc.gc.ca<o:p></o:p></span></p>
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