<html xmlns:v="urn:schemas-microsoft-com:vml" xmlns:o="urn:schemas-microsoft-com:office:office" xmlns:w="urn:schemas-microsoft-com:office:word" xmlns:m="http://schemas.microsoft.com/office/2004/12/omml" xmlns="http://www.w3.org/TR/REC-html40">
<head>
<meta http-equiv="Content-Type" content="text/html; charset=utf-8">
<meta name="Generator" content="Microsoft Word 15 (filtered medium)">
<style><!--
/* Font Definitions */
@font-face
{font-family:"Cambria Math";
panose-1:2 4 5 3 5 4 6 3 2 4;}
@font-face
{font-family:Calibri;
panose-1:2 15 5 2 2 2 4 3 2 4;}
/* Style Definitions */
p.MsoNormal, li.MsoNormal, div.MsoNormal
{margin:0in;
margin-bottom:.0001pt;
font-size:11.0pt;
font-family:"Calibri",sans-serif;}
span.EmailStyle17
{mso-style-type:personal-compose;
font-family:"Calibri",sans-serif;
color:windowtext;}
.MsoChpDefault
{mso-style-type:export-only;
font-family:"Calibri",sans-serif;}
@page WordSection1
{size:8.5in 11.0in;
margin:1.0in 1.0in 1.0in 1.0in;}
div.WordSection1
{page:WordSection1;}
--></style><!--[if gte mso 9]><xml>
<o:shapedefaults v:ext="edit" spidmax="1026" />
</xml><![endif]--><!--[if gte mso 9]><xml>
<o:shapelayout v:ext="edit">
<o:idmap v:ext="edit" data="1" />
</o:shapelayout></xml><![endif]-->
</head>
<body lang="EN-US" link="#0563C1" vlink="#954F72">
<div class="WordSection1">
<p class="MsoNormal">Hello everyone,<o:p></o:p></p>
<p class="MsoNormal">We are looking for a couple standalone hotplates for resist soft and hard bakes. We have one nice, uniform hotplate attached to one of our CEE coaters. However, it takes a long time to change temps and doesn’t get used as much as it
should. The lab hotplates we have are ok for general lab use and not cheap, but are not uniform or reproducible enough for resist baking for sensitive processes (I think that means all processes<span style="font-family:"Segoe UI Emoji",sans-serif">😊</span>).
<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">I’m sure I’ll be overwhelmed with ideas, so thanks in advance. What are your suggestions for resist bake hotplates with uniformity of at least +/- 1 deg F? I do not necessarily need vacuum or proximity, in fact would likely rather not
have those options. <o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Best,<o:p></o:p></p>
<p class="MsoNormal">Aimee<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Sr. Research Associate <o:p></o:p></p>
<p class="MsoNormal">The Ohio State University<o:p></o:p></p>
<p class="MsoNormal">Nanotech West Lab<o:p></o:p></p>
<p class="MsoNormal">Institute for Materials Research<o:p></o:p></p>
<p class="MsoNormal">1381 Kinnear Road<o:p></o:p></p>
<p class="MsoNormal">Suite 100<o:p></o:p></p>
<p class="MsoNormal">Columbus, OH 43212<o:p></o:p></p>
<p class="MsoNormal">614-292-2753<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
</div>
</body>
</html>