<div dir="ltr">Hi Michael-<div>we don't have a Beneq here but we have used TDMAS with our Fiji200, with O2 plasma as the oxygen source.</div><div>I'm not sure if the pulse, purge times would be relevant for a different chamber. We kept TDMAS at room temperature and have done depositions of SiO2 at substrate temp of 100C-250C.</div><div>Recently we have also tried BTBAS (heat to 50C) for our SiO2 film with some decent results. </div><div>Best, </div><div>Sam</div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Wed, Jul 14, 2021 at 8:40 AM Martin,Michael David <<a href="mailto:michael.martin@louisville.edu" target="_blank">michael.martin@louisville.edu</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex">
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Hi guys, <br>
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Would anyone be willing to share process details for using TDMAS (Tris(dimethylamino)silane) on a Beneq ALD system? Beneq tells me they do not have experience with that precursor. Barring a recipe for the particular tool, it would be helpful to just have
a general starting point such as precursor temperature, injection and purge times, substrate temperature, ozone flow rate, etc. There seems to be a frustrating lack of detail in the literature and I have a customer that is chomping at the bit to get SiO2
down. <a href="https://www.sigmaaldrich.com/US/en/substance/trisdimethylaminosilane1613215112897?context=product" id="gmail-m_3617898902190821040gmail-m_-6729114239181519190LPlnk" target="_blank">
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Regards, <br>
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Michael <br>
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</blockquote></div><br clear="all"><div><br></div>-- <br><div dir="ltr"><div dir="ltr"><div><div dir="ltr">Sam Tsitrin</div><div dir="ltr"><br></div><div>R&D Engineer</div><div>UC Berkeley Marvell Nanolab</div></div></div></div>