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Hi guys, <br>
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Would anyone be willing to share process details for using TDMAS (Tris(dimethylamino)silane) on a Beneq ALD system? Beneq tells me they do not have experience with that precursor. Barring a recipe for the particular tool, it would be helpful to just have
a general starting point such as precursor temperature, injection and purge times, substrate temperature, ozone flow rate, etc. There seems to be a frustrating lack of detail in the literature and I have a customer that is chomping at the bit to get SiO2
down. <a class="MuiTypography-root MuiLink-root MuiLink-underlineNone MuiTypography-colorPrimary" href="https://www.sigmaaldrich.com/US/en/substance/trisdimethylaminosilane1613215112897?context=product" id="LPlnk">
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Regards, <br>
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Michael <br>
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<p style="margin-top:0px; margin-bottom:0px; margin-top:0; margin-bottom:0">Senior Process Engineer </p>
<p style="margin-top:0px; margin-bottom:0px; margin-top:0; margin-bottom:0">Micro/Nano Technology Center</p>
<p style="margin-top:0px; margin-bottom:0px; margin-top:0; margin-bottom:0"><span>University of Louisville</span><br>
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