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<p class="MsoNormal">Hi Jerry,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">I’m not familiar with the STS ASE system specifically but based on the pattern starting at the top edge of the wafer extending down towards the center of the sample it looks like a wafer sealing issue to me. We’ve seen similar coloration/roughness
patterns when our Plasmatherm 770 system is not sealing well. I think that would be a good place to start.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Do you know the rest of the process conditions (gases/powers/etc)? That would be the next piece to consider if the sealing is OK and the problem is still present.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">-Dave<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#BB0000;background:white">Dave Hollingshead </span></b><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#333333"><br>
<span style="background:white">Manager of Research Operations – Nanotech West Lab<br>
<b>The Ohio State University</b></span><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#333333;background:white">Suite 100, 1381 Kinnear Road, Columbus, OH 43212</span><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#333333"><br>
<span style="background:white">614.292.1355 Office</span><br>
</span><span style="color:#333333"><a href="mailto:hollingshead.19@osu.edu"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:blue;background:white">hollingshead.19@osu.edu</span></a></span><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#333333;background:white"> </span><span style="color:#333333"><a href="http://osu.edu/"><span style="font-size:9.0pt;font-family:"Arial",sans-serif;color:blue;background:white">osu.edu</span></a></span><span style="color:#333333"><o:p></o:p></span></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>
On Behalf Of </b>Shepard, Jeremiah J<br>
<b>Sent:</b> Wednesday, July 21, 2021 09:44<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] ICP STS ASE Issue<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">I am having some trouble determining what this issue is? We have found a bad capacitor in the matching network, and replaced that, thought all was good but now we face this issue. <o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">Now I am having trouble with grass formation on student sample. Anyone know where to look for this kind of thing? Is it just sample recipe or something else perhaps? Any thoughts are appreciated!
Also unsure of what's going on with the carrier wafer around the sample...?<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">Thanks,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black">Jerry Shepard<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt;color:black"><o:p> </o:p></span></p>
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