<div dir="ltr">Hi Manish,<div><br></div><div>Will positive resist give you 45 degree walls for some dose & focus condition in your exposure tool, probably that's possible, I think if you explore the range. And then if you dry etch, the profile should transfer to Nb in CF4 chemistry or the chemistry you want to use. Your mask needs to be made (shifted) accordingly such that your features are trapezoidal, smaller dimension on top. </div><div><br></div><div>Not sure if you have considered this.</div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Fri, Oct 8, 2021 at 5:11 PM Manish Keswani <<a href="mailto:manish.keswani01@gmail.com">manish.keswani01@gmail.com</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex"><div dir="ltr">Happy Friday Everyone,<div><br></div><div>I have a question about the plasma etching of Niobium. One of our customers is interested in creating sloped sidewall (45 deg, trapezoidal) patterns in Nb (500 nm thick film). Although we have some experience creating similar patterns in silicon and have a general idea about which direction to go in terms of process parameters, we have not done this for Nb. The features are 600 microns x 600 microns or 3 microns x 600 microns openings after the Litho step.</div><div><br></div><div>Does anyone have suggestions? </div><div><br></div><div>Thanks,</div><div>Manish Keswani </div><div>Lawrence Livermore National Laboratory</div><div><br></div><div><br></div></div>
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</blockquote></div><br clear="all"><div><br></div>-- <br><div dir="ltr" class="gmail_signature"><div dir="ltr"><div><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div>Thanks,<br></div><div>Kamal </div><div><br></div></div></div></div></div></div></div></div>