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We have used SPR 220 a lot in the past and came to the conclusion that it was just very finicky probably due to requiring just the right bake and hold times as mentioned by others. In the end, most of our users switched to AZ 4620 which is much easier to process
and is a nice thick resist with a 12um nominal thickness. <br>
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Regards, <br>
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Michael <br>
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<div id="divRplyFwdMsg" dir="ltr"><font face="Calibri, sans-serif" style="font-size:11pt" color="#000000"><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> on behalf of Maduzia, Joseph Walter <jmaduzi2@illinois.edu><br>
<b>Sent:</b> Thursday, November 4, 2021 9:59 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu <labnetwork@mtl.mit.edu><br>
<b>Subject:</b> [labnetwork] PR bubbles where exposed</font>
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<p class="x_MsoNormal">Hello All!</p>
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<p class="x_MsoNormal">Thank you again for all your feedback on SiO2 etch around Al. It has been very helpful and we are moving down multiple paths suggested via the Lab Network to try to solve the issue. More to come once we solve it!</p>
<p class="x_MsoNormal"> </p>
<p class="x_MsoNormal">I have another issue I was hoping for feedback on. We have bubbling in our PR (SPR-220-4.5) (pos tone) that we haven’t been able to track the source of. It only bubbles during exposure and only where it is exposed. Unexposed areas are
unaffected. I’ve attached some images of the bubbling where you can see the exposed (lighter) and unexposed (darker) areas. The bubbles are visible to the naked eye. The wafer is silicon w a dry thermally grown SiO2 surface. We typically expose via EV620 mask
aligner with Vac+HardContact. However, even in a flood exposure with the mask just set lightly down it still bubbles. Without a mask there are also bubbles randomly distributed across the wafer, but they don’t get stuck to the mask so they don’t pop. We tried
various pre-bakes, HMDS coat vs not, piranha treat vs not. In the past these bubbles show up, we trial and error to get rid of them and suddenly they disappear. Our process, although seemingly repeatable, does not yield repeatable results.
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<p class="x_MsoNormal">Thank You,</p>
<p class="x_MsoNormal"><b><span style="color:#13294B; text-transform:uppercase">JOE MADUZIA</span></b><span style="color:black"><br>
</span><i><span style="color:#13294B">MNMS Laboratory Specialist</span></i><span style="color:black"><br>
<br>
</span><span style="color:#13294B">The Grainger College of Engineering</span><span style="color:black"><br>
</span><span style="color:#13294B">Mechanical Science and Engineering</span><span style="color:black"><br>
<br>
</span><span style="color:#13294B">2239 Sidney Lu Mechanical Engineering Bldg</span><span style="color:black"><br>
</span><span style="color:#13294B">1206 W. Green</span><span style="color:black"><br>
</span><span style="color:#13294B">Urbana, IL 61801</span><span style="color:black"><br>
</span><span style="color:#13294B">217.244.6302 | </span><a href="mailto:jmaduzi2@illinois.edu"><span style="color:#0563C1">jmaduzi2@illinois.edu</span></a></p>
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