<div dir="ltr">Hi,<div>See attached paper referring to the glycerin option. According to this paper, adding 1 or 3 parts of glycerin actually decreases the selectivity. Maybe higher glycerin concentration is required.</div><div> <br></div><div><br clear="all"><div><div dir="rtl" class="gmail_signature" data-smartmail="gmail_signature"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="rtl"><div dir="ltr"><span style="font-size:12.8px">With best regards,</span><br></div><div dir="ltr"><span style="font-size:12.8px">_______________</span></div><div dir="ltr"><div><font color="#0b5394"><b>Dr. Dan Haronian</b></font></div><div><font color="#444444">CTO and co-founder</font></div><div><b>m</b>: (+972) 54 542 1951 | <b>e</b>:<a href="mailto:dan@enervibe.co" style="color:rgb(17,85,204)" target="_blank">dan@enervibe.co</a> | <b>w</b>: <a href="http://enervibe.co/" style="color:rgb(17,85,204)" target="_blank">enervibe.co</a><br></div><div><b>Mailing address:</b> 1st floor Barkat building, 1 Golan street, Airport City, Zip code 7019900, ISRAEL<br></div></div><div dir="ltr"><a href="http:///" target="_blank"><img src="https://drive.google.com/a/enervibe.co/uc?id=1ntsdlhz0lxl182ttONqR9iFbzqH3YUKN&export=download" width="200" height="54"></a><br></div><div dir="ltr"><br></div><div dir="ltr"><br></div></div></div></div></div></div></div></div></div></div></div></div></div></div></div><br></div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Wed, 3 Nov 2021 at 16:31, Shimon Eliav <<a href="mailto:shimonel@savion.huji.ac.il">shimonel@savion.huji.ac.il</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex">
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<p class="MsoNormal"><span style="color:rgb(31,73,125)">Hi All,<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">I found very interesting the discussion around Joe’s question.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">Please find attached the summary of the answers.<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">Regards,<u></u><u></u></span></p>
<p class="MsoNormal"><span style="color:rgb(31,73,125)">Shimon<u></u><u></u></span></p>
<p class="MsoNormal"><a name="m_3603151581713111984__MailEndCompose"><span style="color:rgb(31,73,125)"><u></u> <u></u></span></a></p>
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<p class="MsoNormal"><b>From:</b> labnetwork [mailto:<a href="mailto:labnetwork-bounces@mtl.mit.edu" target="_blank">labnetwork-bounces@mtl.mit.edu</a>]
<b>On Behalf Of </b>Maduzia, Joseph Walter<br>
<b>Sent:</b> Tuesday, 26 October 2021 23:49<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> [labnetwork] Mask of Al in HF<u></u><u></u></p>
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<p class="MsoNormal">Hello,<u></u><u></u></p>
<p class="MsoNormal"><u></u> <u></u></p>
<p class="MsoNormal">Does anyone have any suggestions for mask materials to protect Al in HF 49% for SiO2 removal in SOI wafer? The device is SOI, ICP DRIE etched to glass, HF etch to undercut and free devices, but have Al contact pads and AL is dep’d first.
Typically we use PR as pattern mask, but the Al is etching behind the PR. In this case the Al is deposited first, so although order of operations change might help, it’s not a good option atm.<u></u><u></u></p>
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Thank you for any suggestions you might have!<u></u><u></u></p>
<p class="MsoNormal"><b><span style="color:rgb(19,41,75);text-transform:uppercase">JOE MADUZIA</span></b><span style="color:black"><br>
</span><i><span style="color:rgb(19,41,75)">MNMS Laboratory Specialist</span></i><span style="color:black"><br>
<br>
</span><span style="color:rgb(19,41,75)">The Grainger College of Engineering</span><span style="color:black"><br>
</span><span style="color:rgb(19,41,75)">Mechanical Science and Engineering</span><span style="color:black"><br>
<br>
</span><span style="color:rgb(19,41,75)">2239 Sidney Lu Mechanical Engineering Bldg</span><span style="color:black"><br>
</span><span style="color:rgb(19,41,75)">1206 W. Green</span><span style="color:black"><br>
</span><span style="color:rgb(19,41,75)">Urbana, IL 61801</span><span style="color:black"><br>
</span><span style="color:rgb(19,41,75)">217.244.6302 | </span><a href="mailto:jmaduzi2@illinois.edu" target="_blank">jmaduzi2@illinois.edu</a><u></u><u></u></p>
<p class="MsoNormal"><a href="https://cleanroom.mechse.illinois.edu/" target="_blank">https://cleanroom.mechse.illinois.edu/</a><span style="color:black"><br>
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</span><a href="http://illinois.edu/" target="_blank"><span style="color:windowtext;text-decoration:none"><img border="0" width="134" height="35" id="gmail-m_3603151581713111984Picture_x0020_1" src="cid:17d21e3feee4cff311"></span></a><span style="color:black"><br>
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</span><i><span style="color:rgb(102,102,102)">Under the Illinois Freedom of Information Act any written communication to or from university employees regarding university business is a public record and may be subject to public disclosure.</span></i><u></u><u></u></p>
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