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<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US">Dear Long<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US">You can use our Canon DUV stepper (lambda= 284 nm). We usually use 6” wafers. If you are interested, please contact us.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US">Best regards,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US">Matthias<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black">Matthias Keil, M.Sc. Ph.D.<o:p></o:p></span></b></p>
<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:black">Technical University of Denmark<o:p></o:p></span></b></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black">Danchip<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black">Ørsteds Plads<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black">Building 347<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black">2800 Kgs Lyngby<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black">Direct: +45 452 56 492<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black">Lab: +45 452 55 947<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><u><span style="font-size:11.0pt;font-family:"anchip",serif;color:blue"><a href="mailto:makei@dtu.dk"><span lang="EN-US">makei@dtu.dk</span></a></span></u><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><u><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:blue"><a href="http://www.nanolab.dtu.dk">www.nanolab.dtu.dk</a></span></u><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:8.0pt;font-family:"Arial",sans-serif;color:black"><img border="0" width="36" height="53" style="width:.375in;height:.552in" id="Picture_x0020_1" src="cid:image001.gif@01D83551.B3CA6AC0" alt="http://www.dtu.dk/images/DTU_email_logo_01.gif"></span><span lang="EN-US" style="font-size:11.0pt;font-family:"anchip",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="color:black;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> Rebecca Bolt Ettlinger <reet@dtu.dk>
<br>
<b>Sent:</b> 10. marts 2022 11:58<br>
<b>To:</b> Matthias Keil <makei@dtu.dk><br>
<b>Subject:</b> FW: [labnetwork] Large-scale Nanopatterning<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Hi Matthias,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">I saw this on labnetwork, just if you are interested.<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Best,<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D">Rebecca<o:p></o:p></span></p>
<p class="MsoNormal"><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif;color:#1F497D"><o:p> </o:p></span></p>
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<p class="MsoNormal"><b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif">From:</span></b><span lang="EN-US" style="font-size:11.0pt;font-family:"Calibri",sans-serif"> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a>>
<b>On Behalf Of </b>Chang, Long<br>
<b>Sent:</b> 7. marts 2022 16:17<br>
<b>To:</b> Chang, Long <<a href="mailto:lvchang@Central.UH.EDU">lvchang@Central.UH.EDU</a>><br>
<b>Cc:</b> <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> Re: [labnetwork] Large-scale Nanopatterning<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span lang="EN-US">Hello Everyone, <o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">I appreciate the quick responses. The recommendations is either interference lithography or ASML stepper. The stepper is most suitable for this project so I’ll be reaching out to individuals to learn more.<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">Thanks,<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US" style="color:black">Long<o:p></o:p></span></p>
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<p class="MsoNormal" style="margin-bottom:12.0pt"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">On Mar 4, 2022, at 3:33 PM, Chang, Long <<a href="mailto:lvchang@Central.UH.EDU">lvchang@Central.UH.EDU</a>> wrote:<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">Hello, <o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">I need to print 300nm dots with center to center spacing of 500nm on a hexagonal lattice. Currently doing it with EBL, but need to do it faster and cheaper. What are my options? Can this be done with a Stepper somewhere?<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">Thanks,<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">Long<o:p></o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span lang="EN-US">_______________________________________________<br>
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