<div dir="ltr"><p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">Hi,</span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif"> </span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">We are using AZ4620 for 5 to 80 um thick patterns.</span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">Currently, we are developing the beaker.</span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">Anyone has experience with developing thick photoresist by puddle
development system.</span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">What type of development is the best for thick photoresists?</span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">Any recommendation for SUSS Lab spin or Cee developer?</span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif"> </span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">Best regards,</span></p>

<p class="MsoNormal" style="margin:0in;font-size:11pt;font-family:Calibri,sans-serif"><span style="font-size:12pt;font-family:"Times New Roman",serif">Mo Khodadadi</span></p></div>