<div dir="ltr"><div dir="ltr"><span class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">Hi Long,</span><div><span class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)"></span>I do this routinely in an OXFORD RIE tool by bonding to a carrier wafer using a crystal bond that is dissolved in hot water after the etch is done. I have used various other methods of temporary bonding like resist, cool grease, 3M conductive paste, and Fomblin oil<span class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">. B</span>ut, I find crystal bond 555 is much better. <br><div><br>Also, people have used QuickStick™ 135 Temporary Mounting Wax or 509-clear which can be dissolved in Acetone. Also, using the 509- clear I have seen people preparing a spin coatable solution by dissolving it in PGMEA. </div></div><div><br></div><div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">Thanks & br,</div><div class="gmail_default" style="font-family:verdana,sans-serif;color:rgb(0,0,102)">vamsi</div><p class="MsoNormal"><span style="color:black"><br class="gmail-Apple-interchange-newline">___________________________________________________<u></u><u></u></span></p><p class="MsoNormal"><span style="color:black">N.P.  Vamsi Krishna, PhD</span><u></u></p><p class="MsoNormal"><span style="font-variant:inherit;color:black;font-family:Arial,sans-serif;font-size:10pt;margin:0px;padding:0px;border:0px;font-stretch:inherit;line-height:inherit;vertical-align:baseline"><i><b>Staff Scientist</b></i></span><br></p><p style="margin:0in 0in 0.0001pt;font-size:11pt;font-family:Calibri,sans-serif;color:rgb(32,31,30)"><span style="margin:0px;padding:0px;border:0px;font-style:inherit;font-variant:inherit;font-weight:inherit;font-stretch:inherit;font-size:10pt;line-height:inherit;font-family:Arial,sans-serif;vertical-align:baseline;color:maroon;background-image:initial;background-position:initial;background-repeat:initial">Pritzker School of Molecular Engineering, </span><span style="margin:0px;padding:0px;border:0px;font-variant:inherit;font-stretch:inherit;font-size:10pt;line-height:inherit;font-family:Arial,sans-serif;vertical-align:baseline;color:black"><i><b>The University of Chicago </b></i></span></p><p style="margin:0in 0in 0.0001pt"><span style="color:black;font-family:Arial,sans-serif;font-size:10pt;margin:0px;padding:0px;border:0px;font-variant:inherit;font-stretch:inherit;line-height:inherit;vertical-align:baseline"><i><b>Resident </b></i></span><font color="#000000" face="Arial, sans-serif"><span style="font-size:13.3333px"><b><i>Associate</i></b></span></font></p><p style="margin:0in 0in 0.0001pt;font-size:11pt;font-family:Calibri,sans-serif;color:rgb(32,31,30)"><span style="margin:0px;padding:0px;border:0px;font-style:inherit;font-variant:inherit;font-weight:inherit;font-stretch:inherit;font-size:10pt;line-height:inherit;font-family:Arial,sans-serif;vertical-align:baseline;color:black"><span style="color:rgb(128,0,0);font-size:13.3333px">Center for Nanoscale Materials, </span></span><b style="font-size:13.3333px;color:black;font-family:Arial,sans-serif"><i>Argonne National Laboratory </i></b></p><p style="margin:0in 0in 0.0001pt;color:rgb(32,31,30)"><font face="Arial, sans-serif"><span style="font-size:13.3333px">Phone: 1 (331) 757-8565</span></font></p></div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Tue, Apr 12, 2022 at 6:37 AM Jeremy Upham <<a href="mailto:jupham@gmail.com">jupham@gmail.com</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex"><div dir="ltr"><div>I think your plan could work, so I'm not sure that I see the problem<br></div><div><br></div><div>In my experience the carbon in the PR can contribute to the plasma chemistry and affect the etch, so I tend to use vacuum grease as a thermally conducting binder between the etched sample and the backing wafer instead. Though your system may well work for your recipe.<br></div><div><br></div><div>Hope that helps,<br></div><div><br></div><div><div><div><div dir="ltr"><div dir="ltr">Jer Upham PhD<br>Senior Lab Manager / Research Scientist<br>Quantum Photonics Group<br>University of Ottawa<br>Tel.: 1 (613) 562-5800 ext 7325</div></div></div><br></div></div></div><br><div class="gmail_quote"><div dir="ltr" class="gmail_attr">On Mon, Apr 11, 2022 at 6:54 PM Chang, Long <<a href="mailto:lvchang@central.uh.edu" target="_blank">lvchang@central.uh.edu</a>> wrote:<br></div><blockquote class="gmail_quote" style="margin:0px 0px 0px 0.8ex;border-left:1px solid rgb(204,204,204);padding-left:1ex">



<div>
<div style="font-size:9pt;font-family:calibri;color:rgb(255,66,51)"><b>Attention : courriel externe | external email</b></div>
<div>Hi Guys,
<div><br>
</div>
<div>I have an Oxford RIE with backside Helium. I want to etch through the silicon wafer (380um thick). The largest pattern is a 1mm diameter circle. My plan is to ride the 4” sample wafer on a 4" carrier wafer with PR. Does anyone have a good solution
 to this problem?</div>
<div><br>
</div>
<div>Thanks,<br>
<div>
<div dir="auto" style="color:rgb(0,0,0);letter-spacing:normal;text-align:start;text-indent:0px;text-transform:none;white-space:normal;word-spacing:0px;text-decoration:none">
Long</div>
</div>
<br>
</div>
</div>
</div>

</blockquote></div>
_______________________________________________<br>
labnetwork mailing list<br>
<a href="mailto:labnetwork@mtl.mit.edu" target="_blank">labnetwork@mtl.mit.edu</a><br>
<a href="https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork" rel="noreferrer" target="_blank">https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a><br>
</blockquote></div><br clear="all"><div><br></div>-- <br><div dir="ltr" class="gmail_signature"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><div dir="ltr"><font style="font-family:verdana,sans-serif;color:rgb(0,0,102)" size="2"><span style="color:rgb(102,102,102)"><br></span></font><p class="MsoNormal"><span style="color:black">___________________________________________________<u></u><u></u></span></p><p class="MsoNormal"><span style="color:black">N.P.  Vamsi Krishna, PhD</span><u></u></p><p class="MsoNormal"><span style="font-variant:inherit;color:black;font-family:Arial,sans-serif;font-size:10pt;margin:0px;padding:0px;border:0px;font-stretch:inherit;line-height:inherit;vertical-align:baseline"><i><b>Staff Scientist</b></i></span><br></p><p style="margin:0in 0in 0.0001pt;font-size:11pt;font-family:Calibri,sans-serif;color:rgb(32,31,30)"><span style="margin:0px;padding:0px;border:0px;font-style:inherit;font-variant:inherit;font-weight:inherit;font-stretch:inherit;font-size:10pt;line-height:inherit;font-family:Arial,sans-serif;vertical-align:baseline;color:maroon;background-image:initial;background-position:initial;background-repeat:initial">Pritzker School of Molecular Engineering, </span><span style="margin:0px;padding:0px;border:0px;font-variant:inherit;font-stretch:inherit;font-size:10pt;line-height:inherit;font-family:Arial,sans-serif;vertical-align:baseline;color:black"><i><b>The University of Chicago </b></i></span></p><p style="margin:0in 0in 0.0001pt"><span style="color:black;font-family:Arial,sans-serif;font-size:10pt;margin:0px;padding:0px;border:0px;font-variant:inherit;font-stretch:inherit;line-height:inherit;vertical-align:baseline"><i><b>Resident </b></i></span><font color="#000000" face="Arial, sans-serif"><span style="font-size:13.3333px"><b><i>Associate</i></b></span></font></p><p style="margin:0in 0in 0.0001pt;font-size:11pt;font-family:Calibri,sans-serif;color:rgb(32,31,30)"><span style="margin:0px;padding:0px;border:0px;font-style:inherit;font-variant:inherit;font-weight:inherit;font-stretch:inherit;font-size:10pt;line-height:inherit;font-family:Arial,sans-serif;vertical-align:baseline;color:black"><span style="color:rgb(128,0,0);font-size:13.3333px">Center for Nanoscale Materials, </span></span><b style="font-size:13.3333px;color:black;font-family:Arial,sans-serif"><i>Argonne National Laboratory </i></b></p><p style="margin:0in 0in 0.0001pt;color:rgb(32,31,30)"><font face="Arial, sans-serif"><span style="font-size:13.3333px">Phone: 1 (331) 757-8565</span></font></p></div></div></div></div></div></div></div></div></div></div></div></div></div></div></div></div></div>