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<p class="MsoNormal">A fab that I worked in a few years ago used Gensolve. I don’t know exactly what version, but searching “Gensolve resist stripper” brings up a website from vwr and I am sure you could call them to get the right chemical for you. There
was an earlier reply that mentioned EKC after a long plasma etch – I second that recommendation. If you have Si containing polymers, you will need an EKC type of chemical to break down the polymer. It is classic in older semiconductor fabs to strip resist
after an oxide via or contact etch to use EKC. It removes “via crowns”.<o:p></o:p></p>
<p class="MsoNormal">Good Luck<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">John Ransom<o:p></o:p></p>
<p class="MsoNormal">Program Manager – MUSiC Facility<o:p></o:p></p>
<p class="MsoNormal"><b>M</b>ulti-<b>U</b>ser <b>SiC</b> Fabrication Facility<o:p></o:p></p>
<p class="MsoNormal">University of Arkansas<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>
On Behalf Of </b>Katharine Beach<br>
<b>Sent:</b> Thursday, September 22, 2022 3:02 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [labnetwork] PRS-2000 replacment<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">We've been using PRS-2000 for our positive resist strip for years. Due to some supply chain issues, we are considering updating our supplied chemicals. I was wondering what photo resists stripers others are using and would recommend.<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">Thanks,<o:p></o:p></p>
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<p class="MsoNormal">Katharine Beach<o:p></o:p></p>
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<p class="MsoNormal">Lurie Nanofabrication Facility<o:p></o:p></p>
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