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<p class="MsoNormal"><span style="font-size:11.0pt">Dear All,<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">I was wondering if our community members can share their experiences on using Deuterated Silane (SiD4) instead of conventional SiH4 as a precursor for PECVD tools for low-loss optical films.<br>
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Any insights, pros/cons from a process as well as equipment side would be very helpful.<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt">Thanks in advance for any pointers and guidance!<br>
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<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:11.0pt;color:black">Best regards,<br>
Mughees<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:9.0pt;color:black">--<o:p></o:p></span></p>
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-variant:small-caps;color:black">________________<o:p></o:p></span></b></p>
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-variant:small-caps;color:black">Mughees Khan, PhD<o:p></o:p></span></b></p>
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-variant:small-caps;color:black">Senior Scientist | Center for Nanoscale Systems | Harvard University<br>
11 Oxford St | LISE (G38) | Cambridge, MA 02138<o:p></o:p></span></b></p>
<p class="MsoNormal"><b><span style="font-size:9.0pt;font-variant:small-caps;color:black"><a href="mailto:mkhan@fas.harvard.edu"><span style="color:#0563C1">mkhan@fas.harvard.edu</span></a> | O: 617.496.7102 |
<a href="http://www.cns.fas.harvard.edu"><span style="color:#0563C1">www.cns.fas.harvard.edu</span></a></span></b><b><span style="font-size:9.0pt;color:black"><o:p></o:p></span></b></p>
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