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<p class="MsoNormal">Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">We have a trap on our LPCVD furnace to collect the excess material.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Rick<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Richard Morrison<o:p></o:p></p>
<p class="MsoNormal">DMTS<o:p></o:p></p>
<p class="MsoNormal">Draper Laboratory<o:p></o:p></p>
<p class="MsoNormal">555 Technology Square<o:p></o:p></p>
<p class="MsoNormal">Cambridge Ma 02139<o:p></o:p></p>
<p class="MsoNormal">Office: 617-258-3420<o:p></o:p></p>
<p class="MsoNormal">Cell: 508-930-3461<o:p></o:p></p>
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<p class="MsoNormal"><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>
On Behalf Of </b>Hadi Esmaeilsabzali<br>
<b>Sent:</b> Thursday, January 12, 2023 2:35 PM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD<o:p></o:p></p>
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<b><span style="color:#222222">CAUTION:</span></b><span style="color:#222222"> This email originated from outside of the organization. Do not click links or open attachments unless you recognize the sender and know the content is safe.
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<p class="MsoNormal"><span style="color:black">Dear Colleagues,<o:p></o:p></span></p>
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<p class="MsoNormal">For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. <o:p></o:p></p>
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<p class="MsoNormal"><span style="color:black">We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options
for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia).<o:p></o:p></span></p>
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<p class="MsoNormal">Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (<span style="color:black">~30 sccm for up
to 30 mins per run each week - all max values) and it</span> is significantly diluted, this sounded a practical option.<span style="color:black"> I am trying to see if others have tried or can comment on this approach</span>, particularly for a silane-based
PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. <o:p></o:p></p>
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<p class="MsoNormal">I appreciate it if you share other (cost-effective) suggestions you might have for us! <o:p></o:p></p>
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<p class="MsoNormal"><span style="color:black">Thanks,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black">Hadi<o:p></o:p></span></p>
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<p><b><span style="color:#212121">Hadi Esmaeilsabzali, PhD</span></b><span style="font-size:11.5pt;font-family:"Segoe UI",sans-serif;color:#212121"><o:p></o:p></span></p>
<p><span style="color:#212121">Nanofabrication Group Manager, 4D LABS<o:p></o:p></span></p>
<p><span style="color:#212121">Simon Fraser University<o:p></o:p></span></p>
<p><span style="color:#212121">8888 University Dr., Burnaby, B.C. V5A 1S6<br>
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