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<p class="MsoNormal">Hadi –<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">If you only need to abate the SiH4, then you might consider using an Edwards Pyrophoric Conditioning system. Section 1.3 in the attached talks about application specifics, where it will work and where it won’t. It’s still listed on the
Edwards website, so I think it’s still being manufactured.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><a href="https://shop.edwardsvacuum.com/products/pyrophoric%20conditioning%20system%20(pcs)/view.aspx#:~:text=The%20Pyrophoric%20Conditioning%20System%20(PCS,the%20simple%20%22burn%20box%22">https://shop.edwardsvacuum.com/products/pyrophoric%20conditioning%20system%20(pcs)/view.aspx#:~:text=The%20Pyrophoric%20Conditioning%20System%20(PCS,the%20simple%20%22burn%20box%22</a>.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Most folks who use TPUs on PECVD are less concerned with the SiH4 and more concerned with the clean gases as opposed to the deposition gases, especially those classified as greenhouse gases. Abating the SiH4 is just an added bonus.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">We recently sold our only PCS, but there may be others available from equipment brokers, etc. if you have interest. I know of a gov’t contractor who has or had a few, but they had a tough time excessing any unused equipment for resale.
They might be willing to donate to a University though, but perhaps it would need to be a US university. I’m sure this community knows more about that than I do.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Hope this is helpful. I think the PCS is kind of like the middle ground between letting it go out the stack and using a more traditional abatement system.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<div>
<p class="MsoNormal" style="margin-bottom:12.0pt"><b><span style="font-size:12.0pt;color:black">Rob Breisch</span></b><b><span style="font-size:12.0pt;color:navy"><br>
</span></b><span style="font-size:12.0pt;color:black">Vice President, Sales and Marketing</span><b><span style="font-size:4.0pt;color:#003300"><o:p></o:p></span></b></p>
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<p class="MsoNormal"><b><span style="font-size:12.0pt;color:#003300"> Trillium US, Inc.<o:p></o:p></span></b></p>
<p class="MsoNormal"><span style="font-size:12.0pt;color:black"> My Mobile: 801-726-5035<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:12.0pt;color:black"> Trillium Toll Free: 800-453-1340<o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:12.0pt;color:black"> Email: <a href="https://eur01.safelinks.protection.outlook.com/?url=http%3A%2F%2Frob.breisch%40trilliumus.com%2F&data=04%7C01%7Cdoug.smith%40nxp.com%7C6a18a23fd52849ab6e2c08d9a2d36a20%7C686ea1d3bc2b4c6fa92cd99c5c301635%7C0%7C0%7C637719851320585298%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000&sdata=28DKNqx19eklsozNWtmNaSym844LuMy0zetFDNZygeM%3D&reserved=0">
rob.breisch@trilliumus.com</a><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:12.0pt;color:black"> WebSite: <a href="https://eur01.safelinks.protection.outlook.com/?url=http%3A%2F%2Fwww.trilliumus.com%2F&data=04%7C01%7Cdoug.smith%40nxp.com%7C6a18a23fd52849ab6e2c08d9a2d36a20%7C686ea1d3bc2b4c6fa92cd99c5c301635%7C0%7C0%7C637719851320595292%7CUnknown%7CTWFpbGZsb3d8eyJWIjoiMC4wLjAwMDAiLCJQIjoiV2luMzIiLCJBTiI6Ik1haWwiLCJXVCI6Mn0%3D%7C1000&sdata=X54HcYftCFP6zKZ7vzk45e1k%2FRpAfSNZLp4GfLxSYVU%3D&reserved=0">
www.trilliumus.com</a><o:p></o:p></span></p>
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Follow Trillium on LinkedIn</a> <o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:12.0pt;color:black"> </span><span style="font-size:12.0pt;color:navy"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:12.0pt;color:black">This transmission is intended for the named addressee(s) only and may contain confidential and privileged information. Reading, copying or disseminating this transmission by anyone other than
the named addressee(s) is strictly prohibited. If you have received this message in error, please notify us immediately by reply e-mail or phone at (503) 682-3837.<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><b>From:</b> labnetwork <labnetwork-bounces@mtl.mit.edu> <b>
On Behalf Of </b>Aebersold, Julia Weyer<br>
<b>Sent:</b> Friday, January 13, 2023 8:41 AM<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">At the University of Louisville we exhaust our PECVD in the same manner as Draper. We have a lot of exhaust flow, too.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="color:black">Cheers!<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:black">Julia Aebersold, Ph.D.</span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">Manager, Micro/Nano Technology Center</span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">University of Louisville</span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">Shumaker Research Building, Room 233</span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">2210 South Brook Street</span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">Louisville, KY 40292</span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black">(502) 852-1572</span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"> </span><span style="font-size:12.0pt;font-family:"Times New Roman",serif;color:black"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:black"><a href="http://louisville.edu/micronano/"><span style="color:black">http://louisville.edu/micronano/</span></a><o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><b>From:</b> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a>>
<b>On Behalf Of </b>Morrison, Richard H., Jr<br>
<b>Sent:</b> Thursday, January 12, 2023 4:29 PM<br>
<b>To:</b> <a href="mailto:hadi_esmaeilsabzali@sfu.ca">hadi_esmaeilsabzali@sfu.ca</a>;
<a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> Re: [labnetwork] [EXTERNAL] Treating silane exhaust from PECVD<o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal" style="line-height:12.0pt;background:#FF4D4D"><b><span style="font-size:10.0pt;color:black">CAUTION:</span></b><span style="font-size:10.0pt;color:black"> This email originated from outside of our organization. Do not click links, open
attachments, or respond unless you recognize the sender's email address and know the contents are safe.<o:p></o:p></span></p>
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<p class="MsoNormal">Here at Draper PECVD exhaust goes right up the stack, the Dry pump is purged with N2 and the exhaust flow is sufficient that the SiH4 is diluted so that it is not an issue.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">We have a trap on our LPCVD furnace to collect the excess material.<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Rick<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Richard Morrison<o:p></o:p></p>
<p class="MsoNormal">DMTS<o:p></o:p></p>
<p class="MsoNormal">Draper Laboratory<o:p></o:p></p>
<p class="MsoNormal">555 Technology Square<o:p></o:p></p>
<p class="MsoNormal">Cambridge Ma 02139<o:p></o:p></p>
<p class="MsoNormal">Office: 617-258-3420<o:p></o:p></p>
<p class="MsoNormal">Cell: 508-930-3461<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><b>From:</b> labnetwork <<a href="mailto:labnetwork-bounces@mtl.mit.edu">labnetwork-bounces@mtl.mit.edu</a>>
<b>On Behalf Of </b>Hadi Esmaeilsabzali<br>
<b>Sent:</b> Thursday, January 12, 2023 2:35 PM<br>
<b>To:</b> <a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><br>
<b>Subject:</b> [EXTERNAL] [labnetwork] Treating silane exhaust from PECVD<o:p></o:p></p>
</div>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="color:black">Dear Colleagues,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal">For those who run PECVD at their facilities, I am wondering how you process the exhaust from your systems. <o:p></o:p></p>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="color:black">We used to treat the PECVD exhaust along with that of the SiNx tube furnace through a TPU. We have recently decommissioned our furnace and TPU as they were too costly to run and are looking at alternative exhaust options
for the PECVD only. We use our PECVD tool for oxide and nitride deposition, and it's worth noting that it only uses silane (no ammonia).<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal">Some colleagues had mentioned that they don't use a TPU/scrubber and send the process waste to the building exhaust (untreated). Given that our PECVD processes use a relatively small silane flow (<span style="color:black">~30 sccm for up
to 30 mins per run each week - all max values) and it</span> is significantly diluted, this sounded a practical option.<span style="color:black"> I am trying to see if others have tried or can comment on this approach</span>, particularly for a silane-based
PECVD process. Aside from the flammability concerns, we are also aware of the potential oxide buildup in the exhaust system over time. <o:p></o:p></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal">I appreciate it if you share other (cost-effective) suggestions you might have for us! <o:p></o:p></p>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="color:black">Thanks,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black">Hadi<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="color:black"><o:p> </o:p></span></p>
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<p><b><span style="color:#212121">Hadi Esmaeilsabzali, PhD</span></b><span style="font-size:11.5pt;font-family:"Segoe UI",sans-serif;color:#212121"><o:p></o:p></span></p>
<p><span style="color:#212121">Nanofabrication Group Manager, 4D LABS<o:p></o:p></span></p>
<p><span style="color:#212121">Simon Fraser University<o:p></o:p></span></p>
<p><span style="color:#212121">8888 University Dr., Burnaby, B.C. V5A 1S6<br>
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