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    <p>We experience the same thing with our instrument.</p>
    <p>Mario<br>
    </p>
    <div class="moz-cite-prefix">On 2023-06-22 10:28 a.m., Hollingshead,
      Dave wrote:<br>
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cite="mid:SA1PR01MB6544488F2AF7FBED45495CE2F322A@SA1PR01MB6544.prod.exchangelabs.com">
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                padding: 3px;">[<strong>CAUTION:</strong> Non-UBC Email]</font></td>
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        <p class="MsoNormal">Dear Labnetwork,<o:p></o:p></p>
        <p class="MsoNormal"><o:p> </o:p></p>
        <p class="MsoNormal">We have found that exposure of SU-8 on our
          MLA150 tool (using the 375nm laser) seems to require very high
          doses. Even thin ~500nm thick films (using SU-8 2000.5) have
          required doses on the order of 1200mJ/cm<sup>2
          </sup>to fully expose. This is 15-20x the recommended dosage
          from both the datasheet and what we estimate is the exposure
          dose used on our filtered contact aligners. Thicker films
          follow the same trend, but not necessarily in a linear fashion
          (5µm films require ~2000mJ/cm<sup>2</sup>).<o:p></o:p></p>
        <p class="MsoNormal"><o:p> </o:p></p>
        <p class="MsoNormal">I am sure the bump from 365nm to 375nm
          plays a role, but the magnitude of the change seems excessive.
          FWIW, our other negative resists (eg. nLOF2020) seem to expose
          properly at reasonable doses.<o:p></o:p></p>
        <p class="MsoNormal"><o:p> </o:p></p>
        <p class="MsoNormal">Has anyone else experienced this? Does
          anyone have an explanation or any processing suggestions for
          using SU-8 with an MLA?<o:p></o:p></p>
        <p class="MsoNormal"><o:p> </o:p></p>
        <p class="MsoNormal">Thanks,<o:p></o:p></p>
        <p class="MsoNormal">-Dave<o:p></o:p></p>
        <p class="MsoNormal"
style="mso-margin-top-alt:auto;mso-margin-bottom-alt:auto;line-height:11.25pt;background:white"><b><span
style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#BA0C2F;background:white;mso-ligatures:none">Dave
              Hollingshead</span></b><span
style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#3F4443;mso-ligatures:none"><br>
            Manager, Research Operations<br>
            <br>
          </span><b><span
style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#BA0C2F;mso-ligatures:none">The
              Ohio State University</span></b><span
style="font-size:9.0pt;font-family:"Arial",sans-serif;color:#3F4443;mso-ligatures:none"><br>
            Nanotech West Labs<br>
            Suite 100, 1381 Kinnear Rd, Columbus, OH 43212<br>
            614.292.1355 Office<br>
            <span style="background:white"><a
                href="mailto:hollingshead.19@osu.edu"
                moz-do-not-send="true"><span style="color:#0563C1">hollingshead.19@osu.edu</span></a></span>
            /
            <a href="http://nanotech.osu.edu" moz-do-not-send="true"><span
                style="color:#BA0C2F;background:white">nanotech.osu.edu</span></a><br>
            <br>
            Pronouns: he/him/his<o:p></o:p></span></p>
        <p class="MsoNormal"><o:p> </o:p></p>
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      <pre class="moz-quote-pre" wrap="">_______________________________________________
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</pre>
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