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<p class="MsoNormal"><span style="color:windowtext;mso-fareast-language:EN-US">Looks like compressive stress.
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:windowtext;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:windowtext;mso-fareast-language:EN-US">Improve the sample pre-cleaning as suggested or try depositing onto SiO2 and the adhesion should improve.
<o:p></o:p></span></p>
<p class="MsoNormal"><span style="color:windowtext;mso-fareast-language:EN-US"><o:p> </o:p></span></p>
<p class="MsoNormal"><span style="color:windowtext;mso-fareast-language:EN-US">O.
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<p class="MsoNormal"><b><span lang="EN-US" style="color:windowtext">From:</span></b><span lang="EN-US" style="color:windowtext"> labnetwork <labnetwork-bounces@mtl.mit.edu>
<b>On Behalf Of </b>Jeremy Clark<br>
<b>Sent:</b> 24 July 2023 23:36<br>
<b>To:</b> labnetwork@mtl.mit.edu<br>
<b>Subject:</b> Re: [labnetwork] Sparkles in the PECVD deposited amorphous silicon film<o:p></o:p></span></p>
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<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal" style="line-height:16.5pt;background:#F7F9FA"><strong><span style="font-size:10.5pt;font-family:"Calibri",sans-serif;color:#8D3970">CAUTION:</span></strong><span style="font-size:10.5pt;color:#8D3970"> This e-mail originated outside the
University of Southampton. <o:p></o:p></span></p>
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<p>Hi Vibhor,<o:p></o:p></p>
<p><o:p> </o:p></p>
<p>You should look under a microscope but these look like bubbles- either from poor adhesion or too much Hydrogen in the film (or both).<o:p></o:p></p>
<p><o:p> </o:p></p>
<p>How did you clean your sample before deposition? <o:p></o:p></p>
<p>What is the underlying material, and is it possible it has changed?<o:p></o:p></p>
<p>Is possible that some part of the tool was changed recently?<o:p></o:p></p>
<p><o:p> </o:p></p>
<p>Regards,<o:p></o:p></p>
<p>Jeremy Clark<o:p></o:p></p>
<p>Cornell Nanoscale Facility<o:p></o:p></p>
<p><o:p> </o:p></p>
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<p class="MsoNormal">On 7/24/23 13:12, Vibhor Kumar wrote:<o:p></o:p></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">Dear labnetwork community,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">We are trying to deposit a-si (~100 nm) with plasmatherm PECVD. We are using 10% silane. Our recipe worked fine in the past. But this time we started looking some "sparkles" in the deposited film (image attached).
We cleaned the chamber with freon gas, but still the situation is the same. <o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">Any suggestion/s will be highly appreciated. <o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt"><o:p> </o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">Sincerely,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">-Vibhor Kumar-<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">Research Associate,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">School of Engineering,<o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">Rutgers, The State University of New Jersey, NJ <o:p></o:p></span></p>
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<p class="MsoNormal"><span style="font-size:12.0pt">USA.<o:p></o:p></span></p>
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<p class="MsoNormal"><br>
<br>
<o:p></o:p></p>
<pre>_______________________________________________<o:p></o:p></pre>
<pre>labnetwork mailing list<o:p></o:p></pre>
<pre><a href="mailto:labnetwork@mtl.mit.edu">labnetwork@mtl.mit.edu</a><o:p></o:p></pre>
<pre><a href="https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork">https://mtl.mit.edu/mailman/listinfo.cgi/labnetwork</a><o:p></o:p></pre>
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