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<p class="MsoNormal">Hi Labnetwork,<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">We have a user that is interested in processing MgO and MgF2 substrates and we have no experience processing these materials. The user is specifically interested in performing fluorine and oxygen plasma etches, e-beam evaporating, and
sputter depositing on these substrates. We are concerned if these processes will contaminate a chamber that is used for general processing. Is there anyone out there that has any experience that would be willing to discuss with me?<o:p></o:p></p>
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<p class="MsoNormal">Thanks a bunch!<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
<p class="MsoNormal">Peter<o:p></o:p></p>
<p class="MsoNormal"><o:p> </o:p></p>
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<p class="MsoNormal"><span style="font-size:9.0pt;font-family:Helvetica;color:black;mso-ligatures:none">--------------------------------------------------------------</span><span style="font-size:10.0pt;color:black;mso-ligatures:none"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:9.0pt;font-family:Helvetica;color:black;mso-ligatures:none">Peter Lowell, Ph.D.<br>
Senior Process Engineer</span><span style="font-size:10.0pt;color:black;mso-ligatures:none"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:9.0pt;font-family:Helvetica;color:black;mso-ligatures:none">Boulder Micro-Fabrication Facility</span><span style="font-size:10.0pt;color:black;mso-ligatures:none"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:9.0pt;font-family:Helvetica;color:black;mso-ligatures:none">National Institute of Standards and Technology <br>
325 Broadway MS 680.09<br>
Boulder, CO 80305</span><span style="font-size:10.0pt;color:black;mso-ligatures:none"><o:p></o:p></span></p>
<p class="MsoNormal"><span style="font-size:9.0pt;font-family:Helvetica;color:black;mso-ligatures:none">Phone: (303) 497-6934</span><span style="font-size:10.0pt;color:black;mso-ligatures:none"><o:p></o:p></span></p>
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