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<p><span style="font-size:11pt">For t</span><span style="font-size:11pt">hose who operate a DRIE system (specifically SPTS Rapier), I am wondering what your policy is with regard to allowing metallized wafers inside the chamber? Generally, SPTS recommends against
any metal, particularly as the mask, in their Rapier DRIE system (though metals may be used as the etch stop). How do you go about wafers with some (say >5% total surface area) metal features that are coated with enough photoresist to avoid exposure to the
plasma and contaminate the chamber? This should be safe in theory, but do you have any experience with this approach in practice? </span></p>
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<p><span style="font-size:11pt">Any feedback is greatly appreciated!</span></p>
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<p><span style="font-size:11pt">Regards,</span></p>
<p><span style="font-size:11pt">Hadi</span></p>
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<p style="font-family:wf_segoe-ui_normal,"Segoe UI","Segoe WP",Tahoma,Arial,sans-serif,serif,EmojiFont; font-size:15px; color:rgb(33,33,33)">
<b><span style="font-family:Calibri,Helvetica,sans-serif; font-size:11pt">Hadi Esmaeilsabzali, PhD</span></b></p>
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<p style="color:rgb(33,33,33)"><span style="font-family:Calibri,Helvetica,sans-serif; font-size:11pt; font-size:11pt"></span><span style="font-family:Arial,Helvetica,sans-serif,serif,EmojiFont; font-size:10pt"><span style="font-size:11pt; font-family:Calibri,Helvetica,sans-serif">4D
LABS, </span></span><span style="font-family: Calibri, Helvetica, sans-serif; font-size: 11pt;">Simon Fraser University</span></p>
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